公开(公告)号：US4572668A

公开(公告)日：1986-02-25

申请号：US411603

申请日：1982-08-26

Applicant: Gerry L. Auth

Inventor： Gerry L. Auth

IPC: G01J3/02 ,  G01N21/64 ,  G01J3/443 ,  G01N21/63

CPC classification number: G01N21/6489 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/021

Abstract: An optical system is disclosed which significantly enhances the throughput of a grating spectrometer intended to determine impurity concentrations on the surface of semiconductor materials (usually single crystal silicon) used for integrated circuits. The system, which uses a laser beam as the photo-excitation means impinging on a Dewar-contained sample, includes a pre-sample series of lenses which so shapes the laser beam that its shape at the point of impingement on the sample is proportionally similar to the shape of the monochromator slit in the spectrometer. The same lens which provides final focusing of the laser beam on the sample also collects the sample-emitted radiation, which is thereafter focused by suitable optics on the monochromator slit, where it preferably substantially matches the shape of the slit, but slightly overfills the slit.

Abstract translation: 公开了一种光学系统，其显着增强了用于确定用于集成电路的半导体材料（通常为单晶硅）的表面上的杂质浓度的光栅光谱仪的通过量。 使用激光束作为照射在含杜瓦样品上的光激发装置的系统包括一个预采样系列的透镜，其使激光束成形，使其在样品上的撞击点的形状成比例地相似 到光谱仪中的单色器狭缝的形状。 提供激光束在样品上的最终聚焦的相同透镜还收集样品发射的辐射，其随后通过合适的光学器件聚焦在单色仪狭缝上，其中其优选地基本上匹配狭缝的形状，但是稍微超过狭缝 。