公开(公告)号：US20210080842A1

公开(公告)日：2021-03-18

申请号：US16985165

申请日：2020-08-04

Applicant: Gigaphoton Inc.

Inventor： Georg SAUMAGNE

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet light generation device according to an aspect of the present disclosure includes: a chamber; a mirror configured to condense extreme ultraviolet light radiated from plasma generated by irradiating a target supplied into the chamber with a laser beam; an electromagnet disposed outside the chamber to form a magnetic field between a generation region of the plasma in the chamber and the mirror; a current inversion device configured to invert the direction of current flowing through the electromagnet; and a controller configured to control the current inversion device to invert the direction of the current when a set condition is satisfied.