公开(公告)号：US20250126697A1

公开(公告)日：2025-04-17

申请号：US18882498

申请日：2024-09-11

Applicant: Gigaphoton Inc.

Inventor： Yoshiyuki HONDA ,  Hirokazu HOSODA ,  Tomoyoshi TOIDA

IPC: H05G2/00 ,  H01S3/00

Abstract: An extreme ultraviolet light generation apparatus includes a chamber, a target supply unit configured to supply a target into the chamber, a prepulse laser configured to generate a diffusion target having a Gaussian distribution shape convex toward a travel direction of prepulse laser light by irradiating the target with the prepulse laser light, and a main pulse laser configured to generate extreme ultraviolet light by irradiating the diffusion target with main pulse laser light having an intensity distribution of a Gaussian distribution shape.

公开(公告)号：US20240295824A1

公开(公告)日：2024-09-05

申请号：US18398980

申请日：2023-12-28

Applicant: Gigaphoton Inc.

Inventor： Tomoyoshi TOIDA

IPC: G03F7/00

CPC classification number: G03F7/70033 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70141 ,  G03F7/702 ,  G03F7/70525 ,  G03F7/7085

Abstract: An EUV light generation apparatus includes a chamber; a target supply device supplying a first target; a laser device outputting first pulse laser light to be incident on the first target, outputting second pulse laser light to be incident on a second target, and adjusting a control parameter correlated with a shape of plasma generated by the second pulse laser light being incident on the second target; an EUV light concentrating mirror reflecting EUV light emitted from the plasma and concentrating the EUV light on an intermediate focal point; a camera imaging the EUV light and generating a picture including an image of the plasma; and a processor obtaining a value of the control parameter for improving circularity of a profile of the EUV light at the intermediate focal point using the picture and correlation information including a correlation between the shape of the plasma and the control parameter.

公开(公告)号：US20210124275A1

公开(公告)日：2021-04-29

申请号：US17004608

申请日：2020-08-27

Applicant: Gigaphoton Inc.

Inventor： Tomoyoshi TOIDA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet light condensation mirror includes: a substrate; a multi-layer reflective film on the substrate and configured to reflect extreme ultraviolet light having a wavelength of 13.5 nm; and a protective film on the multi-layer reflective film. The protective film includes an oxide silicon layer on the multi-layer reflective film and a titanium oxide layer on the oxide silicon layer having one surface exposed. When x represents the thickness of the titanium oxide layer, the phase of standing wave of the extreme ultraviolet light at the position of the one surface for the maximum reflectance of the extreme ultraviolet light is defined to be zero, and a direction from the one surface toward the multi-layer reflective film is defined to be negative, the position of the one surface is a position at which the phase y of standing wave satisfies the expression below. −0.313x3+1.44x2+2.57x−51.0≤y