SUBSTRATE FOR MASK BLANKS, MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING THEM
    1.
    发明申请
    SUBSTRATE FOR MASK BLANKS, MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING THEM 有权
    遮蔽棉,遮罩,转印面罩的基材及其制造方法

    公开(公告)号:US20170074807A1

    公开(公告)日:2017-03-16

    申请号:US15122484

    申请日:2014-12-09

    CPC classification number: G01N21/956 G01N2021/95676 G03F1/60 G03F1/84

    Abstract: Provided is a mask blank substrate being a substrate having two main surfaces, in which one of the two main surfaces of the mask blank substrate on a side on which a transfer pattern is formed has such a surface profile that, when a measurement region of 2.8 mm×2.1 mm of the main surface in a transfer pattern formation region is measured using a white light interferometer under conditions of a pixel number of 640×480, a power spectrum density at a spatial frequency of 1.0×10−2 μm−1 calculated from a result of the measurement is 6.0×107 nm4 or less.

    Abstract translation: 提供了一种掩模基板,其是具有两个主表面的基板,其中掩模坯料基板的形成有转印图案的一侧的两个主表面之一具有这样的表面轮廓,当测量区域为2.8 在像素数为640×480的条件下,使用白光干涉仪测量转印图案形成区域中的主表面的mm×2.1mm,计算空间频率为1.0×10-2μm-1的功率谱密度 测定结果为6.0×10 7 nm 4以下。

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