公开(公告)号：US20040071889A1

公开(公告)日：2004-04-15

申请号：US10634886

申请日：2003-08-06

Applicant: HOYA CORPORATION

Inventor： Tsutomu Asakawa ,  Kenji Matsumoto ,  Koshi Harada ,  Kyoji Nakayama

IPC: B05D005/06 ,  B05D001/36

CPC classification number: G02B1/115 ,  G02B1/116

Abstract: On producing an antireflection-coated substrate which includes a transparent substrate (1) and an antireflection film formed on the transparent substrate, the antireflection film is made of a multilayer film having a medium refractive index layer (2), a high refractive index layer (3), and a low refractive index layer (4) successively formed on the transparent substrate in this order. The medium refractive index layer is made of a material containing silicon, tin, and oxygen. The high refractive index layer is made of a material containing oxygen and at least one element selected from a group consisting of titanium, niobium, tantalum, and hafnium. The low refractive index layer is made of a material containing silicon and oxygen. The antireflection film is formed by successively depositing these layers by an in-line sputtering apparatus.

Abstract translation: 在制造包括透明基板（1）和形成在透明基板上的抗反射膜的抗反射涂层基板上时，防反射膜由具有介质折射率层（2），高折射率层（ 3）和依次形成在透明基板上的低折射率层（4）。 中等折射率层由含有硅，锡和氧的材料制成。 高折射率层由含有氧和选自钛，铌，钽和铪中的至少一种元素的材料制成。 低折射率层由含有硅和氧的材料制成。 通过在线溅射装置依次沉积这些层来形成抗反射膜。