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公开(公告)号：US10996554B2
公开(公告)日：2021-05-04
申请号：US16796395
申请日：2020-02-20
Applicant: HOYA CORPORATION
Inventor： Takumi Kobayashi , Kazuhiro Hamamoto , Tatsuo Asakawa , Tsutomu Shoki
Abstract: A substrate with an electrically conductive film for fabricating a reflective mask is obtained that is capable of preventing positional shift of the reflective mask during pattern transfer. Provided is a substrate with an electrically conductive film used in lithography, the substrate with an electrically conductive film having an electrically conductive film formed on one of the main surfaces of a mask blank substrate, and a coefficient of static friction of the surface of the electrically conductive film is not less than 0.25.
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公开(公告)号：US10606166B2
公开(公告)日：2020-03-31
申请号：US15580331
申请日：2016-06-08
Applicant: HOYA CORPORATION
Inventor： Takumi Kobayashi , Kazuhiro Hamamoto , Tatsuo Asakawa , Tsutomu Shoki
Abstract: A substrate with an electrically conductive film for fabricating a reflective mask is obtained that is capable of preventing positional shift of the reflective mask during pattern transfer. Provided is a substrate with an electrically conductive film used in lithography, the substrate with an electrically conductive film having an electrically conductive film formed on one of the main surfaces of a mask blank substrate, and a coefficient of static friction of the surface of the electrically conductive film is not less than 0.25.
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