公开(公告)号：US20170315439A1

公开(公告)日：2017-11-02

申请号：US15655932

申请日：2017-07-21

Applicant: HOYA CORPORATION

Inventor： Kazuhiro Hamamoto ,  Yoichi USUI

IPC: G03F1/24 ,  G03F1/38 ,  B32B7/02 ,  G03F7/20

CPC classification number: G03F1/24 ,  B32B7/02 ,  B32B2307/416 ,  B32B2551/00 ,  G03F1/38 ,  G03F7/20

Abstract: A conductive film coated substrate, including a conductive film formed thereon. In a relationship between a bearing area (%) and a bearing depth (nm) that are obtained by measuring, with an atomic force microscope, a region of 1 μm×1 μm of a surface of the conductive film, the surface of the conductive film satisfies a relationship that (BA70-BA30)/(BD70-BD30) is 15 or more and 260 or less (%/nm), and a maximum height (Rmax) is 1.3 nm or more and 15 nm or less.

公开(公告)号：US20160124298A1

公开(公告)日：2016-05-05

申请号：US14896411

申请日：2014-09-22

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Yoichi USUI

IPC: G03F1/24 ,  G03F7/20 ,  B32B7/02

CPC classification number: G03F1/24 ,  B32B7/02 ,  B32B2307/416 ,  B32B2551/00 ,  G03F1/38 ,  G03F7/20

Abstract: Provided is a conductive film coated substrate, including a conductive film formed thereon. In a relationship between a bearing area (%) and a bearing depth (nm) that are obtained by measuring, with an atomic force microscope, a region of 1 μm×1 μm of a surface of the conductive film, the surface of the conductive film satisfies a relationship that (BA70−BA30)/(BD70−BD30) is 15 or more and 260 or less (%/nm), and a maximum height (Rmax) is 1.3 nm or more and 15 nm or less.

Abstract translation: 提供一种导电膜涂覆的基底，其上形成有导电膜。 在通过使用原子力显微镜测量导电膜的表面的1μm×1μm的区域获得的承载面积（％）和轴承深度（nm）之间的关系中，导电性表面 （BA70-BA30）/（BD70-BD30）为15以上且260以下（％/ nm），最大高度（Rmax）为1.3nm以上且15nm以下的关系。