METHOD FOR PTYCHOGRAPHY POSITION CORRECTION BASED ON PROBE WEIGHTING

    公开(公告)号:US20240377626A1

    公开(公告)日:2024-11-14

    申请号:US18346255

    申请日:2023-07-02

    Abstract: The disclosure provides a method for ptychography position correction based on probe weighting. The method includes: collecting diffraction light field intensity information and simultaneously initializing information functions of illumination probes and a sample to be tested and probe positions; obtaining and importing an exit wave into a propagation model to obtain a simulated diffraction light field and replacing the diffraction light field intensity information to obtain an updated diffraction light field; importing the updated diffraction light field into a backpropagation model and obtaining a diffraction exit wave and updating the information functions of the sample to be tested and the illumination probes at each scan position; and forming a probe matrix around the probe positions, updating the probe positions after calculating a correlation, and repeating the above steps to iterate until the predetermined number of iterations is completed or a predetermined condition is reached.

Patent Agency Ranking