公开(公告)号：US3776633A

公开(公告)日：1973-12-04

申请号：US3776633D

申请日：1972-02-10

Applicant: IBM

Inventor： FROSCH A ,  SCHMACKPFEFFER A

IPC: G02B27/58 ,  G03F7/20 ,  G03C5/00

CPC classification number: G03F7/70075 ,  G02B27/58 ,  G03F7/201 ,  G03F7/70091 ,  G03F7/70208 ,  G03F7/7035 ,  G03F7/70583

Abstract: A photographic method and apparatus for exposing a light sensitive layer using a mask spaced from said layer while avoiding ''''ghost lines'''' due to diffraction effects in the developed pattern on the layer. The mask is illuminated by pairs of collimated ray sets, either sequentially or simultaneously, at an angle relative to each other so that the constituent diffraction pattern on the light sensitive layer resulting from one ray set of a pair is shifted with respect to the constituent diffraction pattern attributable to the other ray set of the pair. The shift is such that the ratio of the ''''ghost line'''' intensity to the maximum intensity in the composite diffraction pattern is reduced relative to the corresponding ratio in each of the constituent diffraction patterns. The pairs of ray sets are produced by spacially displaced fixed light sources or by a rotating optical system using a single light source.

Abstract translation: 一种用于使用与所述层间隔开的掩模曝光光敏层的照相方法和装置，同时由于层上显影图案中的衍射效应而避免“幻影线”。 相对于彼此以一定角度顺序地或同时地对准平行光线集，掩模被掩模，使得由一对光线组得到的光敏层上的成分衍射图相对于构成衍射 可归因于该对的其他射线组的图案。 这种移动使得复合衍射图案中的“鬼线”强度与最大强度的比率相对于每个构成衍射图案中的相应比率降低。 这些光线组由空间移动的固定光源或使用单个光源的旋转光学系统产生。

公开(公告)号：US3796476A

公开(公告)日：1974-03-12

申请号：US3796476D

申请日：1972-07-27

Applicant: IBM

Inventor： FROSCH A ,  ZILLER J ,  JAERISCH W ,  SCHMACKPFEFFER A

IPC: G03H1/04 ,  G03H1/00 ,  G02B27/00

CPC classification number: G03H1/00 ,  G03H1/0408 ,  Y10S359/90

Abstract: A method is described for making holograms by means of linearly polarized object and reference beams, the reference beam being reflected inside the photosensitive emulsion. The plane of polarization of a linearly polarized reference beam includes an angle of 45* with its plane of incidence. The beam is reflected under the critical angle of total internal reflection at the lower face of a photographic emulsion. The reflected beam is linearly polarized, too, its plane of polarization being turned by 90*, so that no interference between these two beams is possible. An object beam passes a mask and is linearly polarized vertically either to the reference beam or to the reflected beam so that only one hologram can be formed and no undesired interaction between two holograms is possible when the mask is reproduced for exposure of a photoresist-covered semiconductor wafer.

Abstract translation: 描述了通过线偏振物体和参考光束制作全息图的方法，该参考光束被反射在感光乳剂内。 线性偏振参考光束的偏振面包括与其入射平面成45度的角度。 光束在照相乳剂下表面的全内反射临界角下被反射。 反射光束也被线偏振，其偏振面转动90°，这样两束之间就不会有干涉。 物体光束通过掩模，并且垂直于参考光束或反射光束线性偏振，使得只有一个全息图可以形成，并且当再现掩模以曝光光致抗蚀剂覆盖时，两个全息图之间不会有不期望的相互作用 半导体晶片。