公开(公告)号：US3879597A

公开(公告)日：1975-04-22

申请号：US49810074

申请日：1974-08-16

Applicant: INT PLASMA CORP

Inventor： BERSIN RICHARD L ,  SINGLETON MICHAEL J

IPC: H01L21/302 ,  H01J37/32 ,  H01J65/04 ,  H01L21/3065 ,  H05H1/46 ,  B23K9/00

CPC classification number: H01J37/32009 ,  H01J65/044 ,  H05H1/46 ,  Y10S422/906

Abstract: There is disclosed a device for plasma etching which includes a quartz cylinder surrounded by a coil of electrodes connected to a source of radio frequency energy, and having within it a concentric cylinder or perforated aluminum or other electrically conductive metal.

Abstract translation: 公开了一种用于等离子体蚀刻的装置，其包括被连接到射频能量源的电极线圈围绕的石英圆柱体，并且在其内部具有同心圆筒或穿孔铝或其它导电金属。