公开(公告)号：US20160268218A1

公开(公告)日：2016-09-15

申请号：US15155791

申请日：2016-05-16

Applicant: INTEL CORPORATION

Inventor： CHRISTOPHER J. JEZEWSKI ,  MAURO J. KOBRINSKY ,  DANIEL PANTUSO ,  SIDDHARTH B. BHINGARDE ,  MICHAEL P. O'DAY

IPC: H01L23/00 ,  H01L23/532 ,  H01L23/48 ,  H01L23/528 ,  H01L23/522

CPC classification number: H01L23/562 ,  H01L23/293 ,  H01L23/481 ,  H01L23/522 ,  H01L23/5221 ,  H01L23/5226 ,  H01L23/528 ,  H01L23/5329 ,  H01L23/535 ,  H01L23/5381 ,  H01L23/5386 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Techniques and structure are disclosed for enhancing fracture resistance of back-end interconnects and other such interconnect structures by increasing via density. Increased via density can be provided, for example, within the filler/dummified portion(s) of adjacent circuit layers within a die. In some cases, an electrically isolated (floating) filler line of an upper circuit layer may include a via which lands on a floating filler line of a lower circuit layer in a region corresponding to where the filler lines cross/intersect. In some such cases, the floating filler line of the upper circuit layer may be formed as a dual-damascene structure including such a via. In some embodiments, a via similarly may be provided between a floating filler line of the upper circuit layer and a sufficiently electrically isolated interconnect line of the lower circuit layer. The techniques/structure can be used to provide mechanical integrity for the die.

Abstract translation: 公开了通过增加通孔密度来提高后端互连和其它这种互连结构的抗断裂性的技术和结构。 可以例如在模具内的相邻电路层的填充/加工部分内提供通孔密度的增加。 在一些情况下，上电路层的电隔离（浮置）填充线可以包括在对应于填充线交叉/相交的区域中的下电路层的浮动填充线上的通孔。 在一些这样的情况下，上电路层的浮动填充线可以形成为包括这种通孔的双镶嵌结构。 在一些实施例中，可以在上电路层的浮动填充线和下电路层的充分电隔离的互连线之间提供通孔。 技术/结构可用于为模具提供机械完整性。