公开(公告)号：US20040151982A1

公开(公告)日：2004-08-05

申请号：US10355289

申请日：2003-01-31

Applicant: Indian Institute of Science

Inventor： Srinivasarao Shivashankar ,  Ashok Kumar Shukla ,  Anil Uttam Mane ,  Bellie Hariprakash ,  Shaik Abdul Gaffoor

IPC: H01M004/68 ,  H01M004/82 ,  B05D005/12

CPC classification number: H01M4/14 ,  H01M4/16 ,  H01M4/68 ,  H01M4/82 ,  Y10T29/10 ,  Y10T29/49115

Abstract: A precursor chemical compound is applied to a surface sought to be coated, and subjected to a rapid thermally activated chemical reaction process (RTACRP) in which the temperature is quickly raised and lowered. The desired coating is formed from the precursor chemical compound by a chemical reaction at the elevated temperature. The structural/chemical integrity of the surface is preserved due to the use of RTACRP. The approach may be used to manufacture a high-energy density lead-acid battery.

Abstract translation: 将前体化合物施加到欲涂覆的表面上，并进行迅速升高和降低温度的快速热激活化学反应过程（RTACRP）。 所需的涂层由前体化合物通过化学反应在升高的温度下形成。 由于使用RTACRP，表面的结构/化学完整性得以保留。 该方法可用于制造高能量密度铅酸电池。