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1.发明申请公开(公告)号：US20220018023A1
公开(公告)日：2022-01-20
申请号：US17370386
申请日：2021-07-08
Applicant: Infineon Technologies AG
Inventor： Matthias Kuenle , Olaf Fiedler , Thomas Huber , Christian Illemann , Mathias Male
IPC: C23C16/455 , C23C16/46
Abstract: A processing chamber includes a chamber body, a substrate support configured to hold a substrate in place, and a pre-heat ring having a central opening sized to be disposed around the substrate. A process gas inlet is configured to direct process gas in a lateral direction to flow over the pre-heat ring and the substrate. A process gas flow deflector includes a radially outer mounting portion and a radially inner blade-shaped process gas deflection portion extending in a radial direction. The radially inner blade-shaped process gas deflection portion is shaped as a ring segment. The radially inner blade-shaped process gas deflection portion is disposed above the process gas inlet and dimensioned to overlap with the pre-heat ring, wherein a degree of overlap between the pre-heat ring and process gas flow deflector in the radial direction is at least ½ of the radial dimension of the pre-heat ring.
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公开(公告)号：US11149351B2
公开(公告)日：2021-10-19
申请号：US15700232
申请日：2017-09-11
Applicant: Infineon Technologies AG
Inventor： Matthias Kuenle , Johannes Baumgartl , Manfred Engelhardt , Christian Illemann , Francisco Javier Santos Rodriguez , Olaf Storbeck
IPC: C23C16/54 , C23C16/455 , C30B25/12 , C23C16/458 , C23C16/46 , C23C16/02 , C30B25/10 , C30B25/14 , H01L21/02 , C30B29/06 , C30B29/36
Abstract: A CVD reactor, including a deposition chamber housing a first susceptor and a second susceptor, the first susceptor having a cavity for receiving a first substrate, the first substrate having a front surface and a back surface, the second susceptor having a cavity for receiving a second substrate, the second substrate having a front surface and a back surface, and the first susceptor and the second susceptor are disposed so that the front surface of the first substrate is opposite to the front surface of the second substrate thereby forming a portion of a gas flow channel.
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公开(公告)号：US10906057B2
公开(公告)日：2021-02-02
申请号：US15666928
申请日：2017-08-02
Applicant: Infineon Technologies AG
Inventor： Christian Illemann , Karl Pilch , Herbert Priess
Abstract: A liquid-dispensing system includes at least one nozzle configured to dispense a liquid. The liquid-dispensing system includes at least one sensor module, configured to provide a sensor signal comprising information related to whether liquid is dispensed by the at least one nozzle. At least a part of the at least one sensor is located in proximity of the nozzle.
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Patent Agency Ranking
公开(公告)号：US12064779B2
公开(公告)日：2024-08-20
申请号：US17107060
申请日：2020-11-30
Applicant: Infineon Technologies AG
Inventor： Christian Illemann , Karl Pilch , Herbert Priess
CPC classification number: B05B12/085 , B05B12/008 , G01F25/0092 , G01F1/58 , G01F1/66 , G01F1/661
Abstract: A liquid-dispensing system includes at least one nozzle configured to dispense a liquid. The liquid-dispensing system includes at least one sensor module, configured to provide a sensor signal comprising information related to whether liquid is dispensed by the at least one nozzle. At least a part of the at least one sensor is located in proximity of the nozzle.
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5.发明授权公开(公告)号：US12018369B2
公开(公告)日：2024-06-25
申请号：US17370386
申请日：2021-07-08
Applicant: Infineon Technologies AG
Inventor： Matthias Kuenle , Olaf Fiedler , Thomas Huber , Christian Illemann , Mathias Male
IPC: C23C16/455 , C23C16/458 , C23C16/46
CPC classification number: C23C16/455 , C23C16/45504 , C23C16/45563 , C23C16/45591 , C23C16/4585 , C23C16/46
Abstract: A processing chamber includes a chamber body, a substrate support configured to hold a substrate in place, and a pre-heat ring having a central opening sized to be disposed around the substrate. A process gas inlet is configured to direct process gas in a lateral direction to flow over the pre-heat ring and the substrate. A process gas flow deflector includes a radially outer mounting portion and a radially inner blade-shaped process gas deflection portion extending in a radial direction. The radially inner blade-shaped process gas deflection portion is shaped as a ring segment. The radially inner blade-shaped process gas deflection portion is disposed above the process gas inlet and dimensioned to overlap with the pre-heat ring, wherein a degree of overlap between the pre-heat ring and process gas flow deflector in the radial direction is at least ½ of the radial dimension of the pre-heat ring.
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公开(公告)号：US20210078027A1
公开(公告)日：2021-03-18
申请号：US17107060
申请日：2020-11-30
Applicant: Infineon Technologies AG
Inventor： Christian Illemann , Karl Pilch , Herbert Priess
Abstract: A liquid-dispensing system includes at least one nozzle configured to dispense a liquid. The liquid-dispensing system includes at least one sensor module, configured to provide a sensor signal comprising information related to whether liquid is dispensed by the at least one nozzle. At least a part of the at least one sensor is located in proximity of the nozzle.
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7.发明申请公开(公告)号：US20190078211A1
公开(公告)日：2019-03-14
申请号：US15700232
申请日：2017-09-11
Applicant: Infineon Technologies AG
Inventor： Matthias Kuenle , Johannes Baumgartl , Manfred Engelhardt , Christian Illemann , Francisco Javier Santos Rodriguez , Olaf Storbeck
IPC: C23C16/54 , C23C16/02 , C23C16/455 , H01L21/02
Abstract: A CVD reactor, including a deposition chamber housing a first susceptor and a second susceptor, the first susceptor having a cavity for receiving a first substrate, the first substrate having a front surface and a back surface, the second susceptor having a cavity for receiving a second substrate, the second substrate having a front surface and a back surface, and the first susceptor and the second susceptor are disposed so that the front surface of the first substrate is opposite to the front surface of the second substrate thereby forming a portion of a gas flow channel.
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公开(公告)号：US20180036755A1
公开(公告)日：2018-02-08
申请号：US15666928
申请日：2017-08-02
Applicant: Infineon Technologies AG
Inventor： Christian Illemann , Karl Pilch , Herbert Priess
CPC classification number: B05B12/085 , B05B12/008 , B05B12/082 , G01F1/58 , G01F1/66 , G01F1/661 , G01F25/0092
Abstract: A liquid-dispensing system includes at least one nozzle configured to dispense a liquid. The liquid-dispensing system includes at least one sensor module, configured to provide a sensor signal comprising information related to whether liquid is dispensed by the at least one nozzle. At least a part of the at least one sensor is located in proximity of the nozzle.
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