Localized high density substrate routing

    公开(公告)号:US11515248B2

    公开(公告)日:2022-11-29

    申请号:US17009308

    申请日:2020-09-01

    Abstract: Embodiments of a system and methods for localized high density substrate routing are generally described herein. In one or more embodiments an apparatus includes a medium, first and second circuitry elements, an interconnect element, and a dielectric layer. The medium can include low density routing therein. The interconnect element can be embedded in the medium, and can include a plurality of electrically conductive members therein, the electrically conductive member can be electrically coupled to the first circuitry element and the second circuitry element. The interconnect element can include high density routing therein. The dielectric layer can be over the interconnect die, the dielectric layer including the first and second circuitry elements passing therethrough.

    TECHNIQUES FOR DIE TILING
    4.
    发明申请

    公开(公告)号:US20220238506A1

    公开(公告)日:2022-07-28

    申请号:US17716940

    申请日:2022-04-08

    Abstract: Techniques are provided for fine node heterogeneous-chip packages. In an example, a method of making a heterogeneous-chip package can include coupling electrical terminals of a first side of a first base die to electrical terminals of a first side of a second base die using a silicon bridge, forming an organic substrate about the silicon bridge and adjacent the first sides of the first and second base dies, and coupling a fine node die to a second side of at least one of the first base die or the second base die.

    LOCALIZED HIGH DENSITY SUBSTRATE ROUTING
    9.
    发明申请

    公开(公告)号:US20180350737A1

    公开(公告)日:2018-12-06

    申请号:US16002740

    申请日:2018-06-07

    Abstract: Embodiments of a system and methods for localized high density substrate routing are generally described herein. In one or more embodiments an apparatus includes a medium, first and second circuitry elements, an interconnect element, and a dielectric layer. The medium can include low density routing therein. The interconnect element can be embedded in the medium, and can include a plurality of electrically conductive members therein, the electrically conductive member can be electrically coupled to the first circuitry element and the second circuitry element. The interconnect element can include high density routing therein. The dielectric layer can be over the interconnect die, the dielectric layer including the first and second circuitry elements passing therethrough.

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