公开(公告)号：US20210082797A1

公开(公告)日：2021-03-18

申请号：US16642770

申请日：2017-09-29

Applicant: Intel Corporation

Inventor： Kyu Oh Lee ,  Dilan Seneviratne ,  Ravindranadh T. Eluri

IPC: H01L23/498 ,  H01L23/00 ,  H01L21/48

Abstract: A semiconductor package may include a semiconductor package first side, an embedded bridge interconnect, a first via, and a second via. The bridge interconnect may include a bridge interconnect first side with a conductive pad and a bridge interconnect second side. The distance between the bridge interconnect first side and the semiconductor package first side may be less than a distance between the bridge interconnect second side and the semiconductor package first side. The first and second vias may each include a first end that is narrower than a second end. The semiconductor package first side may be closer to the first end of the first via than the second end of the first via, and closer to the second end of the second via than the first end of the second via. The first side of the semiconductor package may be configured to electrically couple to a die.

公开(公告)号：US20210260718A1

公开(公告)日：2021-08-26

申请号：US16797925

申请日：2020-02-21

Applicant: INTEL CORPORATION

Inventor： Srini Raghavan ,  Sashi Shekhar Kandanur ,  Rahul N. Manepalli ,  Ravindranadh T. Eluri ,  Dilan Seneviratne ,  Clark Linde ,  ABDIAS J. ACOSTA ,  Francoise Bainye Angoua

IPC: B24B37/04 ,  B24B37/20

Abstract: A polishing tool and methodology are disclosed, particularly useful for chemical mechanical polish (CMP) applications (e.g., polishing and planarizing). In an embodiment, the tool includes a carrier structure configured to support a workpiece, a polishing pad configured to rotate and polish at least a portion of the workpiece, a source configured to generate excitation radiation directed towards the workpiece, and a detector configured to receive fluorescence radiation from the workpiece. The fluorescence radiation is generated by absorption of the excitation radiation by a polymer material on the workpiece. The polishing tool also includes a controller configured to, based on a magnitude of the received fluorescence radiation, change at least one operating condition of the polishing tool. For instance, the controller can speed or slow the polishing process, and stop the polishing process when a target thickness is achieved.

公开(公告)号：US20220302005A1

公开(公告)日：2022-09-22

申请号：US17834426

申请日：2022-06-07

Applicant: Intel Corporation

Inventor： Kyu Oh Lee ,  Dilan Seneviratne ,  Ravindranadh T. Eluri

IPC: H01L23/498 ,  H01L21/48 ,  H01L23/00

Abstract: A semiconductor package may include a semiconductor package first side, an embedded bridge interconnect, a first via, and a second via. The bridge interconnect may include a bridge interconnect first side with a conductive pad and a bridge interconnect second side. The distance between the bridge interconnect first side and the semiconductor package first side may be less than a distance between the bridge interconnect second side and the semiconductor package first side. The first and second vias may each include a first end that is narrower than s second end. The semiconductor package first side may be closer to the first end of the first via than the second end of the first via, and closer to the second end of the second via than the first end of the second via. The first side of the semiconductor package may be configured to electrically couple to a die.