公开(公告)号：US20230406986A1

公开(公告)日：2023-12-21

申请号：US18025034

申请日：2021-09-08

Applicant: KJ CHEMICALS CORPORATION

Inventor： Meiri HIRATA ,  Hideki MASUDA

IPC: C08G18/08 ,  C08G73/10 ,  C08L75/00 ,  C08L79/08

CPC classification number: C08G18/0852 ,  C08G73/1032 ,  C08L75/00 ,  C08L79/08 ,  C08L2201/10 ,  C08L2203/16

Abstract: To provide: a solvent used for synthesizing a synthetic resin such as a polyimide resin and a polyurethane resin, the solvent capable of synthesizing a polymer having a high molecular weight in a short time, causing no clouding of a reaction solution during and after reaction, and having high transparency and storage stability; and a method for producing the synthetic resin using the solvent. A solvent (C) for resin synthesis, containing: 10 to 99.9999 mass % of an amide-based solvent (A); and 0.0001 to 5 mass % of a reaction accelerator (B), in which the reaction accelerator (B) is an aliphatic or aromatic tertiary amine compound having one or more tertiary amino groups in a molecule of the reaction accelerator (B).

公开(公告)号：US20250109363A1

公开(公告)日：2025-04-03

申请号：US18844149

申请日：2023-03-07

Applicant: KJ CHEMICALS CORPORATION

Inventor： Meiri HIRATA ,  Toshitsugu KIYOSADA ,  Hideki MASUDA

IPC: C11D7/50 ,  C09K13/06 ,  C09K23/42

Abstract: A composition including: a compound (A) having an N-substituted and/N,N-disubstituted amide group; and a neutralized salt (B) of an acidic compound and a basic compound.