公开(公告)号：US20240194440A1

公开(公告)日：2024-06-13

申请号：US18078828

申请日：2022-12-09

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Amir Azordegan

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: A system and method of an electron multi-beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include one or more electron beam sources configured to generate a plurality of beamlets to simultaneously probe a plurality of measurement regions on a sample. The imaging sub-system may further include one or more electron optics configured to adjust the plurality of beamlets. The imaging sub-system may further include a detector array, where the detector array includes a plurality of detectors configured to detect electrons emanating from a measurement region of the sample. For the system and method, each detector may include a pass-through channel configured for receiving a beamlet of the plurality of beamlets.