公开(公告)号：US20150310160A1

公开(公告)日：2015-10-29

申请号：US14795576

申请日：2015-07-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Frank LASKE ,  Mohammad M. DANESHPANAH ,  Pradeep SUBRAHMANYAN ,  Yalin XIONG

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/84

Abstract: A method and system for generating high density registration maps for masks is disclosed. A data preparation module generates a plurality of anchor points of the mask. Additionally, the data preparation module generates a plurality of sample points. Weights are generated as well in the data preparation module and the weights are used later on in the data fusion module. The positions of anchor points are measured with a registration tool in a mask coordinate system according to a generated recipe. The positions of sample points are determined with an inspection tool in a mask coordinate system according to a generated recipe. The measured positions of the anchor points and the measured positions of the sample points are passed to a data fusion module where a registration map is determined.

Abstract translation: 公开了一种用于产生掩模的高密度登记图的方法和系统。 数据准备模块生成掩模的多个锚定点。 此外，数据准备模块生成多个采样点。 在数据准备模块中也产生权重，后来在数据融合模块中使用权重。 根据生成的配方，使用掩模坐标系中的配准工具测量锚点的位置。 根据生成的配方，采用掩模坐标系中的检查工具确定采样点的位置。 锚定点的测量位置和采样点的测量位置被传递到确定了注册图的数据融合模块。

公开(公告)号：US20150248756A1

公开(公告)日：2015-09-03

申请号：US14643610

申请日：2015-03-10

Applicant: KLA-TENCOR CORPORATION

Inventor： Frank LASKE ,  Mohammad M. DANESHPANAH ,  Slawomir CZERKAS ,  Mark WAGNER

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G03F1/84 ,  G06T2207/30148

Abstract: The invention discloses a method for measuring positions of structures on a mask and thereby determining mask manufacturing errors. It is shown, that from a plurality measurement sites an influence of an optical proximity effect on a position measurement of structures on the mask, is determined with a metrology tool. A rendered image of the data representation of the structures is obtained. Additionally, at least one optical image of the pattern within the area on the mask is captured with the imaging system of the metrology tool. The field of view of the metrology tool is approximately identical to the size of the selected area of the mask design data. Finally, a residual is determined, which shows the manufacturing based proximity effect.

Abstract translation: 本发明公开了一种用于测量掩模上结构位置的方法，从而确定掩模制造误差。 示出了从多个测量位置，使用计量工具确定光学邻近效应对掩模上的结构的位置测量的影响。 获得结构的数据表示的渲染图像。 另外，用计量工具的成像系统捕获掩模区域内的图案的至少一个光学图像。 计量工具的视野与掩模设计数据的选定区域的大小大致相同。 最后，确定残差，显示了基于制造的邻近效应。