公开(公告)号：US20150226539A1

公开(公告)日：2015-08-13

申请号：US14691097

申请日：2015-04-20

Applicant: KLA-TENCOR CORPORATION

Inventor： Klaus-Dieter ROETH ,  Mohammad M. DANESHPANAH ,  Alexander BUETTNER ,  Apo SEZGINER ,  Mark WAGNER

IPC: G01B11/00 ,  G01N21/88

CPC classification number: G01B11/005 ,  G01N21/8806 ,  G01N2201/06113 ,  G01N2201/0691 ,  G01N2201/0697 ,  G03F1/22 ,  G03F1/84

Abstract: A system, a method and a coordinate measuring machine is disclosed for determining the position of defects on objects. An interface is provided so that alignment and coordinate information from the inspection device can be sent to the coordinate measuring machine. A special illumination and detection arrangement is used with a plurality of optical elements in order to obtain a signal from defects on the unpatterned object. The light source of the illumination and detection arrangement is a laser light source for providing a partially coherent light beam. A computer calculates from the data provides by the detector array and the alignment and coordinate information of the object from the inspection device a position of the defect on the object.

Abstract translation: 公开了一种用于确定物体上缺陷位置的系统，方法和坐标测量机。 提供了一个接口，使得来自检查装置的对准和坐标信息可以发送到坐标测量机。 与多个光学元件一起使用特殊的照明和检测装置，以便获得来自未图案化物体上的缺陷的信号。 照明和检测装置的光源是用于提供部分相干光束的激光光源。 计算机根据检测器阵列提供的数据和来自检查装置的物体的对准和坐标信息来计算物体上缺陷的位置。

公开(公告)号：US20150248756A1

公开(公告)日：2015-09-03

申请号：US14643610

申请日：2015-03-10

Applicant: KLA-TENCOR CORPORATION

Inventor： Frank LASKE ,  Mohammad M. DANESHPANAH ,  Slawomir CZERKAS ,  Mark WAGNER

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G03F1/84 ,  G06T2207/30148

Abstract: The invention discloses a method for measuring positions of structures on a mask and thereby determining mask manufacturing errors. It is shown, that from a plurality measurement sites an influence of an optical proximity effect on a position measurement of structures on the mask, is determined with a metrology tool. A rendered image of the data representation of the structures is obtained. Additionally, at least one optical image of the pattern within the area on the mask is captured with the imaging system of the metrology tool. The field of view of the metrology tool is approximately identical to the size of the selected area of the mask design data. Finally, a residual is determined, which shows the manufacturing based proximity effect.

Abstract translation: 本发明公开了一种用于测量掩模上结构位置的方法，从而确定掩模制造误差。 示出了从多个测量位置，使用计量工具确定光学邻近效应对掩模上的结构的位置测量的影响。 获得结构的数据表示的渲染图像。 另外，用计量工具的成像系统捕获掩模区域内的图案的至少一个光学图像。 计量工具的视野与掩模设计数据的选定区域的大小大致相同。 最后，确定残差，显示了基于制造的邻近效应。