Apparatus for inspecting film on substrate by using optical interference and method thereof

    公开(公告)号:US10852125B2

    公开(公告)日:2020-12-01

    申请号:US16202543

    申请日:2018-11-28

    Abstract: A substrate inspection apparatus is disclosed. The substrate inspection apparatus according to the present disclosure may include: a light source configured to radiate laser light onto a coated film that is spread on a region of a substrate; a light detector configured to obtain optical interference data on an interference between reference light, that is generated by the laser light being reflected from a surface of the coated film, and measurement light, that is generated by the laser light penetrating the coated film and being scattered; and a processor configured to derive a thickness of the coated film corresponding to the region, based on the optical interference data.

    Apparatus for inspecting substrate and method thereof

    公开(公告)号:US11543238B2

    公开(公告)日:2023-01-03

    申请号:US17060633

    申请日:2020-10-01

    Abstract: A substrate inspection apparatus is disclosed. The substrate inspection apparatus includes: a first light source configured to radiate an ultraviolet light onto a coated film of a substrate, the coated film being mixed with fluorescent pigments; a first light detector configured to capture fluorescence generated from the coated film onto which the ultraviolet light is radiated, and to obtain a two-dimensional (2D) image of the substrate; a processor configured to derive one region among a plurality of regions of the substrate based on the 2D image; a second light source configured to radiate a laser light onto the one region; and a second light detector configured to obtain optical interference data generated from the one region by the laser light, wherein the processor is configured to derive a thickness of the coated film of the one region based on the optical interference data.

    Apparatus for inspecting substrate and method thereof

    公开(公告)号:US10859371B2

    公开(公告)日:2020-12-08

    申请号:US16202450

    申请日:2018-11-28

    Abstract: A substrate inspection apparatus is disclosed. The substrate inspection apparatus includes: a first light source configured to radiate an ultraviolet light onto a coated film of a substrate, the coated film being mixed with fluorescent pigments; a first light detector configured to capture fluorescence generated from the coated film onto which the ultraviolet light is radiated, and to obtain a two-dimensional (2D) image of the substrate; a processor configured to derive one region among a plurality of regions of the substrate based on the 2D image; a second light source configured to radiate a laser light onto the one region; and a second light detector configured to obtain optical interference data generated from the one region by the laser light, wherein the processor is configured to derive a thickness of the coated film of the one region based on the optical interference data.

    Blood flow measurement device and blood flow measurement method

    公开(公告)号:US12193802B2

    公开(公告)日:2025-01-14

    申请号:US17430225

    申请日:2020-02-11

    Abstract: A blood flow measurement device according to various embodiments may be configured to irradiate light to a first position of a subject and a second position of the subject located in a first direction with respect to the first position, acquire intensities of the reflected light at the first position and the second position, determine a first value which is a difference between the intensities of the reflected light at the first position and the second position, irradiate light to a third position of the subject located in a second direction with respect to the second position, acquire an intensity of the reflected light at the third position, determine a second value which is a difference between the intensities of the reflected light at the second position and the third position, and determine a blood flow direction based on the first value and the second value.

    Apparatus for inspecting substrate and method thereof

    公开(公告)号:US10823548B2

    公开(公告)日:2020-11-03

    申请号:US16202450

    申请日:2018-11-28

    Abstract: A substrate inspection apparatus is disclosed. The substrate inspection apparatus includes: a first light source configured to radiate an ultraviolet light onto a coated film of a substrate, the coated film being mixed with fluorescent pigments; a first light detector configured to capture fluorescence generated from the coated film onto which the ultraviolet light is radiated, and to obtain a two-dimensional (2D) image of the substrate; a processor configured to derive one region among a plurality of regions of the substrate based on the 2D image; a second light source configured to radiate a laser light onto the one region; and a second light detector configured to obtain optical interference data generated from the one region by the laser light, wherein the processor is configured to derive a thickness of the coated film of the one region based on the optical interference data.

    APPARATUS FOR INSPECTING SUBSTRATE AND METHOD THEREOF

    公开(公告)号:US20190162522A1

    公开(公告)日:2019-05-30

    申请号:US16202450

    申请日:2018-11-28

    CPC classification number: G01B11/0675 G01B9/02091 G01N21/64 G01N21/95

    Abstract: A substrate inspection apparatus is disclosed. The substrate inspection apparatus includes: a first light source configured to radiate an ultraviolet light onto a coated film of a substrate, the coated film being mixed with fluorescent pigments; a first light detector configured to capture fluorescence generated from the coated film onto which the ultraviolet light is radiated, and to obtain a two-dimensional (2D) image of the substrate; a processor configured to derive one region among a plurality of regions of the substrate based on the 2D image; a second light source configured to radiate a laser light onto the one region; and a second light detector configured to obtain optical interference data generated from the one region by the laser light, wherein the processor is configured to derive a thickness of the coated film of the one region based on the optical interference data.

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