公开(公告)号：US20240266156A1

公开(公告)日：2024-08-08

申请号：US18427460

申请日：2024-01-30

Applicant: KOREA INSTITUTE OF FUSION ENERGY

Inventor： Jongsik KIM

IPC: H01J37/32 ,  H01P5/18 ,  H03H7/01 ,  H03H7/06

CPC classification number: H01J37/3299 ,  H01J37/32091 ,  H01J37/321 ,  H01P5/182 ,  H03H7/06 ,  H03H7/1791 ,  H01J2237/24564

Abstract: Provided is a module for measuring current/voltage/power of a plasma apparatus, which includes a process chamber having a sealed processing space in which plasma is formed to process a substrate; a substrate support unit disposed in the processing space and on which a substrate is seated; and a gas injection unit configured to inject gas for performing a process in the processing space, wherein, in a substrate processing apparatus configured to process the substrate by applying RF power to the process chamber, the gas support unit, and the gas injection unit, the module for measuring current/voltage/power of the plasma apparatus is disposed adjacent to at least one application line among a first power application line for applying the RF power and a ground line for grounding to measure a RF voltage, current, and power of an input wave and a reflected wave generated by plasma generated in the processing space.