公开(公告)号：US20250084196A1

公开(公告)日：2025-03-13

申请号：US18580684

申请日：2022-07-04

Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY

Inventor： Eun-Ho SOHN ,  Won Wook SO ,  In Joon PARK ,  Bong Jun CHANG ,  Hong Suk KANG ,  Ju Hyeon KIM ,  Ji Hoon BAIK ,  Sang Goo LEE ,  Hyeon Jun HEO ,  Shin Hong YOOK ,  Dong Je HAN ,  Ji Young LEE

IPC: C08F220/14 ,  C08F220/22 ,  C08J5/18

Abstract: An aspect of the present invention is to provide a fluorine-based polymer showing a significantly low dielectric constant of less than 1.8 and a fluorine-based polymer composition including the same. The fluorine-based polymer provided in an aspect of the present invention shows a very low dielectric constant, wherein the polymer is not only a pollution-reducing material generating no harmful substance, but may also be utilized as a coating material in various fields due to high adhesiveness. Furthermore, a polymer film employing the polymer as a material has a volume resistance of about 5.8×1015 Ohmcm, showing an excellent resistance value as an insulating material.