公开(公告)号：US10738353B2

公开(公告)日：2020-08-11

申请号：US16120007

申请日：2018-08-31

Applicant: LIFE TECHNOLOGIES CORPORATION

Inventor： David Light ,  Wolfgang Hinz ,  Ronald Cicero ,  Christina Inman ,  Paul Kenney ,  Alexander Mastroianni ,  Roman Rozhkov ,  Yufang Wang ,  Jeremy Gray ,  Marc Glazer ,  Dmitriy Gremyachinskiy

IPC: C12Q1/6837 ,  C12Q1/6869 ,  C12Q1/6834 ,  C12Q1/6806

Abstract: A method of forming a polymer matrix array includes applying an aqueous solution into wells of a well array. The aqueous solution includes polymer precursors. The method further includes applying an immiscible fluid over the well array to isolate the aqueous solution within the wells of the well array and polymerizing the polymer precursors isolated in the wells of the well array to form the polymer matrix array. An apparatus includes a sensor array, a well array corresponding to the sensor array, and an array of polymer matrices disposed in the well array.

公开(公告)号：US11578356B2

公开(公告)日：2023-02-14

申请号：US16938192

申请日：2020-07-24

Applicant: LIFE TECHNOLOGIES CORPORATION

Inventor： David Light ,  Wolfgang Hinz ,  Ronald Cicero ,  Christina Inman ,  Paul Kenney ,  Alexander Mastroianni ,  Roman Rozhkov ,  Yufang Wang ,  Jeremy Gray ,  Marc Glazer ,  Dmitriy Gremyachinskiy

IPC: C12Q1/6837 ,  C12Q1/6869 ,  C12Q1/6834 ,  C12Q1/6806

Abstract: A method of forming a polymer matrix array includes treating a surface within a well of a well array with a surface compound including a surface reactive functional group and a radical-forming distal group; applying an aqueous solution including polymer precursors to the well of the well array; and activating the radical-forming distal group of the surface coupling compound with an initiator and atom transfer radical polymerization (ATRP) catalyst to initiate radical polymerization of the polymer precursors within the well of the well array to form the polymer matrix array.

公开(公告)号：US09080968B2

公开(公告)日：2015-07-14

申请号：US13734696

申请日：2013-01-04

Applicant: LIFE TECHNOLOGIES CORPORATION

Inventor： Christina Inman ,  Alexander Mastroianni ,  Wolfgang Hinz ,  Shifeng Li ,  Scott Benson

IPC: H01L27/14 ,  G01N27/414

CPC classification number: H01L21/31105 ,  G01N27/4145 ,  H01L21/31144

Abstract: A method of manufacturing a sensor, the method including forming an array of chemically-sensitive field effect transistors (chemFETs), depositing a dielectric layer over the chemFETs in the array, depositing a protective layer over the dielectric layer, etching the dielectric layer and the protective layer to form cavities corresponding to sensing surfaces of the chemFETs, and removing the protective layer. The method further includes, etching the dielectric layer and the protective layer together to form cavities corresponding to sensing surfaces of the chemFETs. The protective layer is at least one of a polymer, photoresist material, noble metal, copper oxide, and zinc oxide. The protective layer is removed using at least one of sodium hydroxide, organic solvent, aqua regia, ammonium carbonate, hydrochloric acid, acetic acid, and phosphoric acid.

Abstract translation: 一种制造传感器的方法，所述方法包括形成化学敏感场效应晶体管阵列（chemFET），在阵列中的chemFET上沉积介电层，在电介质层上沉积保护层，蚀刻电介质层和 保护层以形成对应于chemFET的感测表面的空腔，以及去除保护层。 该方法还包括：将电介质层和保护层一起蚀刻以形成对应于chemFET的感测表面的空腔。 保护层是聚合物，光致抗蚀剂材料，贵金属，氧化铜和氧化锌中的至少一种。 使用氢氧化钠，有机溶剂，王水，碳酸铵，盐酸，乙酸和磷酸中的至少一种除去保护层。