公开(公告)号：US11961714B2

公开(公告)日：2024-04-16

申请号：US17334855

申请日：2021-05-31

Applicant: LINCO TECHNOLOGY CO., LTD.

Inventor： Yi-Yuan Huang ,  Yi-Cheng Liu

IPC: H01J37/32 ,  H01J1/00 ,  H01J3/00 ,  H01J5/00

CPC classification number: H01J37/32357 ,  H01J37/32449 ,  H01J37/32522 ,  H01J37/32743 ,  H01J37/32834 ,  H01J2237/3341

Abstract: A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.