公开(公告)号：US20230119729A1

公开(公告)日：2023-04-20

申请号：US18077567

申请日：2022-12-08

Applicant: Meta Platforms Technologies, LLC

Inventor： Guohua Wei ,  Qi Zhang ,  Andrew John Ouderkirk ,  Matthew E. Colburn

IPC: F21V8/00 ,  G02B27/01

Abstract: Outcoupling elements are disposed with a transparent layer. A transparent waveguide structure receives non-visible light and delivers the non-visible light to the outcoupling elements. The outcoupling elements outcouple the non-visible light as non-visible illumination light.

公开(公告)号：US11789186B1

公开(公告)日：2023-10-17

申请号：US17216038

申请日：2021-03-29

Applicant: Meta Platforms Technologies, LLC

Inventor： Giuseppe Calafiore ,  Austin Lane ,  Matthew E. Colburn

IPC: G02B5/18 ,  G02B6/34 ,  G03F7/00

CPC classification number: G02B5/1857 ,  G02B6/34 ,  G03F7/0005

Abstract: An optical device with a variable index of refraction is formed by exposing a film to an energy gradient. The optical device has angular selectivity. The optical device can be used as an output coupler for a waveguide used in a virtual-reality and/or augmented-reality apparatus.

公开(公告)号：US11780819B2

公开(公告)日：2023-10-10

申请号：US17098130

申请日：2020-11-13

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Lafe Purvis ,  Austin Lane ,  Matthew E. Colburn

IPC: C07D303/18 ,  C07C321/28 ,  C07C271/54 ,  C07C271/58 ,  C07C333/04 ,  G03H1/02 ,  C07C321/20 ,  C08L33/14

CPC classification number: C07D303/18 ,  C07C271/54 ,  C07C271/58 ,  C07C321/20 ,  C07C321/28 ,  C07C333/04 ,  C08L33/14 ,  G03H1/0248 ,  G03H2001/0264 ,  G03H2223/24 ,  G03H2260/12

Abstract: The disclosure provides recording materials including aromatic substituted alkane-core derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several structures are disclosed, including Formula I. When used in Bragg gratings applications, the monomers and polymers disclosed lead to materials with higher refractive index, low birefringence, and high transparency. The disclosed derivatized monomers and polymers can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.

公开(公告)号：US11718580B2

公开(公告)日：2023-08-08

申请号：US16865073

申请日：2020-05-01

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Austin Lane ,  Matthew E. Colburn ,  Lafe Purvis

IPC: G03H1/02 ,  C07C69/54 ,  C07C271/48 ,  C07C323/62 ,  G03F7/035 ,  G03F7/027 ,  G03F7/025

CPC classification number: C07C271/48 ,  C07C69/54 ,  C07C323/62 ,  G03F7/025 ,  G03F7/027 ,  G03H1/0248 ,  G03H2001/0264 ,  G03H2260/12

Abstract: The disclosure provides recording materials include fluorene derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several fluorene structures are disclosed: simply substituted fluorenes, cardo-fluorenes, and spiro-fluorenes. Fluorene derivatized polymers in Bragg gratings applications lead to materials with higher refractive index, low birefringence, and high transparency. Fluorene derivatized monomers/polymers can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.

公开(公告)号：US11709422B2

公开(公告)日：2023-07-25

申请号：US17024081

申请日：2020-09-17

Applicant: Meta Platforms Technologies, LLC

Inventor： Elliott Franke ,  Nihar Ranjan Mohanty ,  Ankit Vora ,  Austin Lane ,  Matthew E. Colburn

IPC: G03F7/00 ,  G03F7/09 ,  G03F7/11 ,  G02B27/01 ,  G03F7/12 ,  F21V8/00

CPC classification number: G03F7/0005 ,  G02B6/0016 ,  G02B6/0038 ,  G02B6/0065 ,  G02B27/0172 ,  G03F7/091 ,  G03F7/11 ,  G03F7/12 ,  G02B2027/0178

Abstract: Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.

公开(公告)号：US11634528B2

公开(公告)日：2023-04-25

申请号：US16865022

申请日：2020-05-01

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Austin Lane ,  Matthew E. Colburn

IPC: C08F283/00 ,  C08F2/48 ,  G02B1/04 ,  G02B5/02 ,  G02B5/18 ,  G02B5/20

Abstract: Initiator/mediator chemistry for latent imaging polymers for volume Bragg gratings is provided. Light mediated chemistry including the use of nitroxides allows a first step imaging to occur, where a light induced pattern is recorded in the material, without the grating being apparent. A second bleaching/developing step completes the curing process and reveals the grating.

公开(公告)号：US11733647B2

公开(公告)日：2023-08-22

申请号：US16840124

申请日：2020-04-03

Applicant: Meta Platforms Technologies, LLC

Inventor： Austin Lane ,  Matthew E. Colburn

IPC: G03H1/02 ,  C08L75/04 ,  C08F2/48 ,  C08F20/18

CPC classification number: G03H1/02 ,  C08F2/48 ,  C08F20/18 ,  C08L75/04 ,  C08F2438/01 ,  C08F2438/03 ,  G03H2001/0264

Abstract: Techniques disclosed herein relate to holographic optical materials and elements. An example of a holographic recording material includes matrix monomers characterized by a first refractive index and configured to polymerize to form a polymer matrix, writing monomers dispersed in the matrix monomers and characterized by a second refractive index different from the first refractive index, and a photocatalyst for controlled radical polymerization of the writing monomers. The writing monomers are configured to polymerize upon exposed to recording light. The photocatalyst is dispersed in the matrix monomers. The photocatalyst includes, for example, a transition metal photocatalyst or a metal-free organic photocatalyst, such as a photocatalyst for atom transfer radical polymerization or a transition metal photocatalyst for addition fragmentation chain transfer polymerization.

公开(公告)号：US11592675B2

公开(公告)日：2023-02-28

申请号：US17569477

申请日：2022-01-05

Applicant: Meta Platforms Technologies, LLC

Inventor： Ying Geng ,  Jacques Gollier ,  Alexander Sohn ,  Matthew E. Colburn

IPC: G02B27/01 ,  H01L27/32 ,  H04N13/332 ,  H04N13/344 ,  H04N13/324

Abstract: An electronic display assembly includes a display element and a corrective element coupled to the display element. The display element has a first plurality of sub-pixels of a first type and a second plurality of sub-pixels of a second type. Two adjacent sub-pixels of the first plurality of sub-pixel are separated by a sub-pixel distance. The corrective element has a plurality of features configured to diffuse light emitted by the first plurality of sub-pixels such that an apparent distance between the two adjacent sub-pixels of the first type, viewed at a viewing distance away from the electronic display assembly, is less than the sub-pixel distance.

公开(公告)号：US20220342219A1

公开(公告)日：2022-10-27

申请号：US17672444

申请日：2022-02-15

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Poer Sung ,  Guohua Wei ,  Tingling Rao ,  Lafe Joseph Purvis, II ,  Kimberly Kay Childress ,  Aman Boromand ,  Andrew John Ouderkirk ,  Matthew E. Colburn

IPC: G02B27/01 ,  G02B27/00 ,  G02B6/122 ,  G02B6/12

Abstract: A system comprising (1) at least one optical element having a nonplanar surface, (2) at least one photonic integrated circuit disposed on the nonplanar surface of the optical element, the photonic integrated circuit comprising (A) an optical core that contains an optically anisotropic organic material and (B) a cladding disposed over the optical core. Various other apparatuses, systems, and methods are also disclosed.

公开(公告)号：US20220326436A1

公开(公告)日：2022-10-13

申请号：US17849065

申请日：2022-06-24

Applicant: Meta Platforms Technologies, LLC

Inventor： Matthew E. Colburn ,  Giuseppe Calafiore ,  Matthieu Charles Raoul Leibovici ,  Nihar Ranjan Mohanty

IPC: G02B6/124 ,  G02B27/01 ,  H01J37/305 ,  H01L21/321 ,  H01L21/027 ,  G02B5/18

Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.