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公开(公告)号：US09007559B2
公开(公告)日：2015-04-14
申请号：US13214470
申请日：2011-08-22
Applicant: Michael Layh , Udo Dinger
Inventor： Michael Layh , Udo Dinger
CPC classification number: G21K1/06 , G03F7/70175 , G03F7/70891 , G21K2201/065 , G21K2201/067
Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.
Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。
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公开(公告)号：US20120050703A1
公开(公告)日：2012-03-01
申请号：US13214470
申请日：2011-08-22
Applicant: Michael Layh , Udo Dinger
Inventor： Michael Layh , Udo Dinger
CPC classification number: G21K1/06 , G03F7/70175 , G03F7/70891 , G21K2201/065 , G21K2201/067
Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.
Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。
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公开(公告)号：US20080130076A1
公开(公告)日：2008-06-05
申请号：US12009984
申请日：2008-01-23
Applicant: Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
Inventor： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC classification number: B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.
Abstract translation: 提供了一种用于微光刻的照明系统。 该照明系统包括具有多个场光栅元件的光学元件，其中照射场的平面以及位于从光学元件到平面的光路中的掠入射镜之后的光学元件。 照明系统在光路中，光学元件之后和平面之前没有其他掠入射镜。
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公开(公告)号：US07375798B2
公开(公告)日：2008-05-20
申请号：US11657420
申请日：2007-01-24
Applicant: Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
CPC classification number: G02B17/0657 , G02B17/0652 , G03B27/54 , G03F7/70233 , G03F7/70275
Abstract: There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in said object plane into an image in said image plane. The image has a width W and a secant length SL, and the width W is greater than about 2 mm.
Abstract translation: 提供了一个EUV光学投影系统。 该系统包括位于从物平面到像平面的光路中的第一镜，第二镜，第三镜，第四镜，第五镜和第六镜，用于将所述物平面中的物体成像成 所述图像平面中的图像。 图像具有宽度W和割线长度SL，宽度W大于约2mm。
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公开(公告)号：US07355678B2
公开(公告)日：2008-04-08
申请号：US11243407
申请日：2005-10-04
Applicant: Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
CPC classification number: G02B17/0657 , G02B17/0652 , G03B27/54 , G03F7/70233 , G03F7/70275
Abstract: An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).
Abstract translation: EUV光学投影系统包括用于对图像（IM）上的物体（OB）进行成像的至少六个反射表面。 该系统优选地配置成沿着从物体（OB）到次级反射镜（M 2）和第三反射镜（M 3）之间的图像（IM）的光路形成中间图像（IMI），使得主 反射镜（M 1）和副镜（M 2）形成第一光学组（G 1）和第三反射镜（M 3），第四反射镜（M 4），第五反射镜（M5）和第六反射镜 （M 6）形成第二光学组（G 2）。 该系统还优选地包括沿着从物体（OB）到主镜（M 1）和副镜（M 2）之间的图像（IM）的光路定位的孔径光阑（APE）。 副镜（M 2）优选为凹面，第三反射镜（M 3）优选为凸面。 六个反射表面中的每一个优选地以小于大约15°的入射角从中心场点接收主光线（CR）。 该系统优选地在图像（IM）处具有大于0.18的数值孔径。 优选地，该系统构造成使得主光线（CR）在副反射镜（M 2）和第三反射镜（M 3）之间传播的同时朝向光轴（OA）会聚。
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Patent Agency Ranking
公开(公告)号：US20070153252A1
公开(公告)日：2007-07-05
申请号：US11657420
申请日：2007-01-24
Applicant: Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
IPC: G03B27/54
CPC classification number: G02B17/0657 , G02B17/0652 , G03B27/54 , G03F7/70233 , G03F7/70275
Abstract: There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in said object plane into an image in said image plane. The image has a width W and a secant length SL, and the width W is greater than about 2 mm.
Abstract translation: 提供了一个EUV光学投影系统。 该系统包括位于从物平面到像平面的光路中的第一镜，第二镜，第三镜，第四镜，第五镜和第六镜，用于将所述物平面中的物体成像成 所述图像平面中的图像。 图像具有宽度W和割线长度SL，宽度W大于约2mm。
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公开(公告)号：US20070070322A1
公开(公告)日：2007-03-29
申请号：US11604997
申请日：2006-11-28
Applicant: Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
Inventor： Russell Hudyma , Hans-Jurgen Mann , Udo Dinger
IPC: G03B27/54
CPC classification number: G03F7/70233 , G02B17/0652 , G02B17/0657 , G03F7/70275
Abstract: An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.
Abstract translation: EUV光学投影系统包括用于将物体（OB）成像到图像（IM）的至少六个反射镜（M 1，M 2，M 3，M 4，M 5，M 6）。 优选地，至少一个镜对配置为至少相位补偿镜对。 该系统优选地被配置成沿着从物体（OB）到第二反射镜（M 2）和第三反射镜（M 3）之间的图像（IM））的光路形成中间图像（IMI），使得第一 反射镜（M 1）和第二反射镜（M 2）形成第一光学组（G 1）和第三反射镜（M 3），第四反射镜（M 4），第五反射镜（M5）和第六反射镜 （M 6）形成第二光学组（G 1）。 该系统还优选地包括沿着从物体（OB）到第一反射镜（M 1）和第二反射镜（M 2）之间的图像（IM））的光路定位的孔径光阑（APE）。 第二镜（M 2）优选为凸面，第三镜（M 3）优选为凹面。 该系统优选地形成数值孔径大于0.18的图像（IM）。
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公开(公告)号：US07186983B2
公开(公告)日：2007-03-06
申请号：US10919583
申请日：2004-08-17
Applicant: Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
Inventor： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC classification number: B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
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9.发明申请Euv projection lens with mirrors made from material with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature 有权Euv投影透镜，具有由具有不同符号的材料制成的反射镜，用于在零转变温度附近的热膨胀系数的温度依赖性升高公开(公告)号：US20070035814A1
公开(公告)日：2007-02-15
申请号：US10577163
申请日：2003-09-27
Applicant: Udo Dinger , Frank Eisert , Stefan Koehler , Andreas Ochse , Johannes Zellner , Martin Lowisch , Timo Laufer
Inventor： Udo Dinger , Frank Eisert , Stefan Koehler , Andreas Ochse , Johannes Zellner , Martin Lowisch , Timo Laufer
IPC: G06K7/10
CPC classification number: G03F7/70958 , B82Y10/00 , G02B1/00 , G02B5/0891 , G02B7/181 , G03F7/70891 , G21K1/062 , G21K2201/065
Abstract: A projection objective 1 for short wavelengths, in particular for wavelengths λ
Abstract translation: 用于短波长的投影物镜1，特别是对于波长λ<157nm的投影物镜1设置有多个反射镜M 1，M 2，M 3，M 4，M 5和M 6，其被精确地相对于光学 轴5。 反射镜M 1，M 2，M 3，M 4，M 5和M 6具有多层涂层。 提供了至少两种不同的镜材料，其热膨胀系数的上升与热膨胀系数的过零区域中的温度的函数不同，特别是大小的符号。
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10.发明授权公开(公告)号：US06700952B2
公开(公告)日：2004-03-02
申请号：US09760091
申请日：2001-01-11
Applicant: Udo Dinger , Martin Ross-Messemer
Inventor： Udo Dinger , Martin Ross-Messemer
IPC: G21K106
CPC classification number: G03F7/702 , G02B5/1828 , G02B5/1838 , G03F7/70075 , G03F7/70158
Abstract: There is provided an optical apparatus for radiation with a wavelength ≦160 nm. The apparatus comprises a mirror with a mirror surface, and a first device for generating elastic oscillations with different acoustic wavelengths on the mirror surface due to surface deformations. Radiation impinging on the mirror surface is diffracted in a predetermined range of angles (&agr;).
Abstract translation: 提供了一种波长<= 160nm的辐射光学装置。 该装置包括具有镜面的反射镜，以及用于由于表面变形而在镜面上产生具有不同声波长的弹性振荡的第一装置。 撞击在镜面上的辐射在预定的角度范围（α）被衍射。
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