公开(公告)号：US20220084858A1

公开(公告)日：2022-03-17

申请号：US17456338

申请日：2021-11-23

Applicant: Micron Technology, Inc.

Inventor： David Palsulich ,  Nicholas A. Wieber

IPC: H01L21/67 ,  H01L21/02 ,  H01J49/10 ,  H01L21/66

Abstract: A method of contaminant detection comprises exposing a wafer comprising one or more contaminants to microdroplets of an oxidizer to form an oxide on a surface of the wafer, exposing the oxide to an etchant to remove the oxide and leave the one or more contaminants on the surface of the wafer, and determining a composition of the one or more contaminants. Additional methods and related tools are also disclosed.

公开(公告)号：US11742230B2

公开(公告)日：2023-08-29

申请号：US17456338

申请日：2021-11-23

Applicant: Micron Technology, Inc.

Inventor： David Palsulich ,  Nicholas A. Wieber

IPC: H01L21/67 ,  H01L21/02 ,  H01J49/10 ,  H01L21/66

CPC classification number: H01L21/67288 ,  H01J49/105 ,  H01L21/0206 ,  H01L21/02164 ,  H01L21/02236 ,  H01L22/12

Abstract: A method of contaminant detection comprises exposing a wafer comprising one or more contaminants to microdroplets of an oxidizer to form an oxide on a surface of the wafer, exposing the oxide to an etchant to remove the oxide and leave the one or more contaminants on the surface of the wafer, and determining a composition of the one or more contaminants. Additional methods and related tools are also disclosed.

公开(公告)号：US11211272B2

公开(公告)日：2021-12-28

申请号：US16582420

申请日：2019-09-25

Applicant: Micron Technology, Inc.

Inventor： David Palsulich ,  Nicholas A. Wieber

IPC: H01L21/67 ,  H01L21/02 ,  H01J49/10 ,  H01L21/66

Abstract: A method of contaminant detection comprises exposing a wafer comprising one or more contaminants to microdroplets of an oxidizer to form an oxide on a surface of the wafer, exposing the oxide to an etchant to remove the oxide and leave the one or more contaminants on the surface of the wafer, and determining a composition of the one or more contaminants. Additional methods and related tools are also disclosed.

公开(公告)号：US20210090920A1

公开(公告)日：2021-03-25

申请号：US16582420

申请日：2019-09-25

Applicant: Micron Technology, Inc.

Inventor： David Palsulich ,  Nicholas A. Wieber

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/66 ,  H01J49/10

Abstract: A method of contaminant detection comprises exposing a wafer comprising one or more contaminants to microdroplets of an oxidizer to form an oxide on a surface of the wafer, exposing the oxide to an etchant to remove the oxide and leave the one or more contaminants on the surface of the wafer, and determining a composition of the one or more contaminants. Additional methods and related tools are also disclosed.