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    Detection method of metal impurity in wafer
    2.
    发明授权
    Detection method of metal impurity in wafer 有权

    公开(公告)号：US12107016B2

    公开(公告)日：2024-10-01

    申请号：US17196116

    申请日：2021-03-09

    Applicant: Zing Semiconductor Corporation

    Inventor： Lanlin Wen ,  Tian Feng ,  Zhen Zhou

    IPC: H01L21/225 ,  H01J49/00 ,  H01J49/10 ,  H01L21/66

    CPC classification number: H01L22/10 ,  H01J49/0031 ,  H01J49/105 ,  H01L21/2252 ,  H01L22/12

    Abstract: The present application provides a detection method of metal impurity in wafer. The method comprises conducting a medium temperature thermal treatment for a first predicted time period to the wafer, cooling the wafer and conducting a low temperature thermal treatment for a second predicted time period, cooling the wafer to ambient temperature; providing a liquid of vapor phase decomposition on the wafer to collect metal impurities; atomizing the liquid containing the collected metal impurities, conducting an inductively coupled plasma mass spectrometry analysis and obtaining concentrations of the metal impurities. The present application applies the combination of various thermal treatment without an interrupt of cooling to ambient temperature to contemplate diffusions of various metal impurities to the wafer surface. Accordingly, the detection of metal impurities can be conducted with reduced time cost and enhanced efficiency.

    Stabilized cell acquisition for elemental analysis
    5.
    发明授权
    Stabilized cell acquisition for elemental analysis 有权

    公开(公告)号：US12013391B2

    公开(公告)日：2024-06-18

    申请号：US16383241

    申请日：2019-04-12

    Applicant: Fluidigm Canada Inc.

    Inventor： Vladimir Baranov ,  Alexander Loboda ,  Michael Sullivan

    IPC: G01N33/53 ,  G01N33/58 ,  H01J49/10

    CPC classification number: G01N33/5306 ,  G01N33/58 ,  H01J49/105 ,  G01N2458/15 ,  G01N2560/00

    Abstract: Analyzing samples injected into an inductively coupled plasma source can be improved by one or more of a stabilizing solution mixable with a sample prior to injection and a heated injector. The stabilizing solution can minimize the difference in osmotic pressure between the solution and the cells with a relatively low amount of dissolved solids (e.g., at or below about 0.2%). The stabilizing solution can contain a salt (e.g., ammonium nitrate) present in concentrations of at least 5 mM. The injector can be heated before and/or during injection. In some cases, heat from adjacent parts can be channeled into the injector to improve heating of the injector. An injector heated to sufficient temperatures can minimize solute buildup and can extend the usable time between cleanings. These improvements can be especially useful in elemental analysis, such as inductively coupled plasma mass spectrometry or inductively coupled plasma optical emission spectrometry.

    Plasma generating device
    6.
    发明授权
    Plasma generating device 有权

    公开(公告)号：US11961730B2

    公开(公告)日：2024-04-16

    申请号：US17912226

    申请日：2021-03-29

    Applicant: ATONARP INC.

    Inventor： Naoki Takahashi

    IPC: H01J49/10 ,  H01J49/42 ,  H05H1/30

    CPC classification number: H01J49/105 ,  H05H1/30 ,  H01J49/4215

    Abstract: A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.

    Mass spectrometer
    10.
    发明授权
    Mass spectrometer 有权

    公开(公告)号：US11887832B2

    公开(公告)日：2024-01-30

    申请号：US17703899

    申请日：2022-03-24

    Applicant: Thermo Fisher Scientific (Bremen) GmbH

    Inventor： Johannes Schwieters ,  Gerhard Jung

    IPC: H01J49/28 ,  H01J49/06 ,  H01J49/10

    CPC classification number: H01J49/288 ,  H01J49/067 ,  H01J49/105

    Abstract: An isotope ratio mass spectrometer has an ion source, a static field mass filter, a reaction cell to induce a mass shift reaction, and a sector field mass analyser for spatially separating ions from the reaction cell according to their m/z. A detector platform detects a plurality of different ion species separated by the sector field mass analyser. The static field mass filter has a first Wien filter that deflects ions away from a longitudinal symmetry axis of the spectrometer in accordance with the ions' m/z, and a second Wien filter that deflects ions back towards the longitudinal symmetry axis in accordance with the ions' m/z. An inverting lens is positioned along the longitudinal axis between the Wien filters to invert the direction of deflection of the ions from the first Wien filter. The static field mass filter provides high transmission and improved spectrometer sensitivity. The first and second Wien filters permit simple tuning.

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