POROUS CARBON AND RESIN COMPOSITION

    公开(公告)号:US20220185667A1

    公开(公告)日:2022-06-16

    申请号:US17600870

    申请日:2020-02-13

    Abstract: A porous carbon has an ID/IG of 2.0 or more in a Raman spectrum measured by Raman spectroscopy with respect to the porous carbon wherein the IG is an accumulated intensity of a peak for G band around 1590 cm−1, and the ID is an accumulated intensity of a peak for D band around 1350 cm−1. The porous carbon has pores having a size of less than 1 μm. The porous carbon can be contained in a resin composition for producing a varistor element.

    RESIN COMPOSITION FOR FORMING VARISTOR AND VARISTOR

    公开(公告)号:US20210155769A1

    公开(公告)日:2021-05-27

    申请号:US16770699

    申请日:2018-12-04

    Inventor: Yoshitaka KAMATA

    Abstract: Provided are a resin composition for forming a varistor and a varistor capable of increasing freedom in the design of substrates, ICs, or electronics. The resin composition for forming a varistor includes (A) an epoxy resin, (B) a curing agent, (C) carbon nanotubes, and (D) a dispersant. The (C) carbon nanotubes may be single-walled carbon nanotubes, multi-walled carbon nanotubes, or a combination thereof. The (D) dispersant includes a polyalkyl oxide surfactant. The polyalkyl oxide surfactant has a polyalkyl ether skeleton in the molecule.

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