公开(公告)号：US20210349299A1

公开(公告)日：2021-11-11

申请号：US17235302

申请日：2021-04-20

Applicant: NATIONAL CHUNG CHENG UNIVERSITY

Inventor： HSIANG-CHEN WANG ,  KAI-CHUN LI ,  KAI-HSIANG KE ,  CHUN-WEN LIANG

IPC: G02B21/36 ,  G01J3/44 ,  G01N21/65 ,  G01J3/28

Abstract: A method for analyzing 2D material thin film and a system for analyzing 2D material thin film are disclosed. The detection method includes the following steps: capturing sample images of 2D material thin films; measuring the 2D material thin films by a Raman spectrometer; performing a visible light hyperspectral algorithm on the sample images by a processor to generate a plurality of visible light hyperspectral images; performing a training and validation procedure, performing an image feature algorithm on the visible light hyperspectral images, and establishing a thin film prediction model based on a validation; and capturing a thin-film image to be measured by the optical microscope, performing the visible light hyperspectral algorithm, and then generating a distribution result of the thin-film image to be measured according to an analysis of the thin film prediction model.