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公开(公告)号：US20180298498A1
公开(公告)日：2018-10-18
申请号：US15767461
申请日：2016-11-21
Applicant: NHK Spring Co., Ltd.
Inventor： Yoshihito Araki , Yuichiro Yamauchi
Abstract: A laminate includes: a substrate made of a metal or an alloy having a Vickers hardness of 120 HV or more and having irregularities on a surface of the substrate; and a film made of a metal or an alloy and formed on the surface of the substrate. The film forms metal bonding with the substrate.
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Patent Agency Ranking
公开(公告)号：US12247296B2
公开(公告)日：2025-03-11
申请号：US17259609
申请日：2019-07-17
Applicant: NHK Spring Co., Ltd. , IZUMI TECHNO INC.
Inventor： Toshihiko Hanamachi , Shuhei Morota , Go Takahara , Masaru Takimoto , Hibiki Yokoyama , Hiroshi Mitsuda , Yoshihito Araki , Kengo Ajisawa
IPC: C23C28/04
Abstract: A member for a plasma processing device includes: an aluminum base material; and an oxide film formed on the aluminum base material and having a porous structure, the oxide film including a first oxide film formed on a surface of the aluminum base material, a second oxide film formed on the first oxide film, and a third oxide film formed on the second oxide film, wherein the first oxide film is harder than the second oxide film and the third oxide film, and a hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.
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公开(公告)号：US20220009022A1
公开(公告)日：2022-01-13
申请号：US17413680
申请日：2019-12-13
Applicant: NHK Spring Co., Ltd.
Inventor： Toshihiko Hanamachi , Daisuke Fujino , Masaru Takimoto , Yoshihito Araki , Masahiro Fujii
IPC: B23K20/02 , B23K20/00 , B23K20/233
Abstract: A joining method of joins a main body and a cover, the main body being a flat plate and made of aluminum or an aluminum alloy and including a passage through which a medium for promoting heat exchange is circulated, and the cover being a flat plate and made of aluminum or an aluminum alloy and configured to cover the passage of the main body. The method includes: a covering step of covering the main body with the cover; and a diffusion bonding step of joining the main body and the cover by diffusion bonding under a condition in which a joining temperature is 500° C. or higher and 640° C. or lower, and a joining surface pressure is 0.7 MPa or higher. Each of a joining surface of the main body and a joining surface of the cover has a flatness of 0.2 or less.
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公开(公告)号：US11477858B2
公开(公告)日：2022-10-18
申请号：US16653094
申请日：2019-10-15
Applicant: NHK SPRING CO., LTD.
Inventor： Toshihiko Hanamachi , Kenji Sekiya , Daisuke Hashimoto , Satoshi Hirano , Masaru Takimoto , Go Takahara , Yoshihito Araki , Arata Tatsumi , Takashi Kawasaki , Yuki Toyama , Satoshi Anzai
Abstract: A small diameter sheath heater with improved reliability is provided. The sheath heater according to one embodiment of the present invention includes a metal sheath, a heating wire having a band shape, the heating wire arranged with a gap within the metal sheath so as to rotate with respect to an axis direction of the metal sheath, an insulating material arranged in the gap, and connection terminals arranged at one end of the metal sheath, the connection terminals electrically connected with both ends of the heating wire respectively.
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公开(公告)号：US20220026151A1
公开(公告)日：2022-01-27
申请号：US17312110
申请日：2019-12-03
Applicant: NHK Spring Co., Ltd.
Inventor： Yoshihito Araki , Shuhei Morota , Toshihiko Hanamachi , Hibiki Yokoyama
Abstract: A plate includes: a main body; a flow channel provided in the main body and configured to flow inert gas therein; a cover configured to cover a surface of the main body where the flow channel is formed; a buried member buried in an opening of the flow channel, the buried member including a buried portion fixed to the flow channel and made of dense ceramic, and a flow portion held by the buried portion and configured to let the inert gas flow from an inside to an outside of the main body, at least a part of the flow portion being made of porous ceramic; and a plurality of through holes provided in the flow portion. A ratio of a diameter of an outer circumference of the buried portion to a diameter of a smallest circle among circles including all of the through holes is 1.2 or higher.
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公开(公告)号：US20210292911A1
公开(公告)日：2021-09-23
申请号：US17259609
申请日：2019-07-17
Applicant: NHK Spring Co., Ltd. , IZUMI TECHNO INC.
Inventor： Toshihiko Hanamachi , Shuhei Morota , Go Takahara , Masaru Takimoto , Hibiki Yokoyama , Hiroshi Mitsuda , Yoshihito Araki , Kengo Ajisawa
IPC: C23C28/04
Abstract: A member for a plasma processing device includes: an aluminum base material; and an oxide film formed on the aluminum base material and having a porous structure, the oxide film including a first oxide film formed on a surface of the aluminum base material, a second oxide film formed on the first oxide film, and a third oxide film formed on the second oxide film, wherein the first oxide film is harder than the second oxide film and the third oxide film, and a hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.
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