公开(公告)号：US20190127847A1

公开(公告)日：2019-05-02

申请号：US16167910

申请日：2018-10-23

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Satoshi NAKAHASHI ,  Kaoru TSURUTA

IPC: C23C16/44 ,  H01J37/317 ,  H01J37/20 ,  H01J37/21 ,  H01J37/32

Abstract: A drawing apparatus includes: a drawing part; a cleaning-gas generator; a first valve between the cleaning-gas generator and the drawing part and adjusting a supply amount of gas to the drawing part; a first pressure gauge measuring a pressure in the drawing part; a compensation-gas introducing part introducing compensation-gas to be supplied between the cleaning-gas generator and the first valve; a second valve between the compensation-gas introducing part and the first valve and adjusting a supply amount of the compensation-gas;and a valve controller controlling the first and second valves, wherein the valve controller controls the first valve to supply the cleaning-gas at a predetermined flow rate to the drawing part and controls the second valve to cause a pressure in the drawing part to be a predetermined pressure when the first pressure gauge detects a pressure reduction due to a reduction in a supply flow rate of the cleaning-gas.

公开(公告)号：US20150041671A1

公开(公告)日：2015-02-12

申请号：US14446899

申请日：2014-07-30

Applicant: NuFlare Technology, Inc.

Inventor： Tomoo MOTOSUGI ,  Hirohito ANZE ,  Satoshi NAKAHASHI

IPC: H01J37/302 ,  H01J37/317

CPC classification number: H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764

Abstract: A charged particle beam writing method includes determining whether a difference between one of the total area of a pattern and the number of shots in a stripe region with respect to one of adjacent stripe regions of the stripe regions and one of the total area and the number of shots with respect to the other of the adjacent stripe regions exceeds a threshold value, re-dividing, when the difference exceeds the threshold value, a stripe region where the total area or the number of shots is larger than that of the other stripe region in the adjacent stripe regions so that the difference of the total area or the number of shots becomes lower than or equal to the threshold value, and writing a pattern in the stripe regions including a re-divided stripe region, in the writing order of arrangement of the stripe regions.

Abstract translation: 带电粒子束写入方法包括：确定图案的总面积之一与条纹区域中的相邻条带区域中的一个相对于条纹区域中的拍摄数量之间的差异以及总区域和数量之一 相对于另一个相邻条带区域的拍摄超过阈值，当差超过阈值时，重新分割总区域或拍摄数量大于其他条纹区域的区域 在相邻的条带区域中，使得总面积或拍摄数量的差变得低于或等于阈值，并且以包括重划分条纹区域在内的条纹区域以书写顺序 的条纹区域。

公开(公告)号：US20220230834A1

公开(公告)日：2022-07-21

申请号：US17577630

申请日：2022-01-18

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Satoshi NAKAHASHI ,  Nobuo MIYAMOTO ,  Takahito NAKAYAMA ,  Shunji SHINKAWA

IPC: H01J37/073 ,  H01J37/317

Abstract: An electron beam writing apparatus comprising, a cathode configured to emit an electron beam, a condition controller configured to change a condition under which the electron beam is emitted from the cathode in a plurality of ways, and a prediction unit configured to predict a life span of the cathode based on a temporal change in an amount of fluctuation of a beam characteristic of the electron beam to a change in the condition when the condition is changed.

公开(公告)号：US20240297010A1

公开(公告)日：2024-09-05

申请号：US18659093

申请日：2024-05-09

Applicant: NuFlare Technology, Inc.

Inventor： Eita FUJISAKI ,  Takahito NAKAYAMA ,  Satoshi NAKAHASHI

IPC: H01J37/04 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/202

Abstract: A writing apparatus irradiates a predetermined position on an irradiation target with multiple charged particle beams to write a predetermined pattern on the irradiation target. The writing apparatus includes a beam generation mechanism generating multiple charged particle beams; a blanking aperture mechanism comprising a limiting aperture substrate shielding the generated multiple charged particle beams and a deflector deflecting the multiple charged particle beams in a predetermined direction, and blanking the multiple charged particle beams; a stage having the irradiation target mounted thereon and being movable; a driver moving the limiting aperture substrate; and a controller controlling the writing apparatus. The controller moves the limiting aperture substrate from an arrangement location at the time of writing in a plane perpendicular to an axial direction of the multiple charged particle beams in a blanking period, and returns the limiting aperture substrate to the arrangement location at the time of writing.