公开(公告)号：US10898882B2

公开(公告)日：2021-01-26

申请号：US16252940

申请日：2019-01-21

Applicant: Naieel Technology

Inventor： Jaewoo Kim ,  Young-Soo Seo ,  Tae Jin Kim ,  Jun Ki Kim ,  Won-Il Lee ,  Duckbong Seo

IPC: B01J27/24 ,  C01B21/064 ,  B01J23/42 ,  B01J23/44 ,  B01J35/00 ,  B01J37/34 ,  B01J37/02

Abstract: The boron nitride nanostructure according to an embodiment of the present invention forms defects through surface modification and incorporates the metallic nanoparticles on the surface defects.