公开(公告)号：US20220293390A1

公开(公告)日：2022-09-15

申请号：US17654707

申请日：2022-03-14

Applicant: Nikon Corporation

Inventor： Jacek Kazimierz Tyminski ,  Daniel Gene Smith ,  Steven Douglas Slonaker ,  Stephen Paul Renwick ,  Johnathan Agustin Marquez

IPC: H01J37/244 ,  H01J37/20 ,  B33Y30/00

Abstract: Electron beam position, size, or shape can be estimated by deflecting the beam to a plurality of apertures, either continuously or step-wise. Beam portions transmitted, absorbed, or scattered can be used to assess position, size, and shape. In other examples, a beam sensing aperture and the beam are oscillated with respect to each other by moving the aperture or varying the beam deflection or both. The beam can be directed to segmented detectors such as a quad detector, and currents in the segments used to assess beam position, shape, or size. The segments can be formed from a single conductive sheet on which the segments are defined but remain attached. After the conductive sheet is secured with an insulative adhesive, portions of the conductive sheet are broken away, leaving aligned segments.

公开(公告)号：US11061338B2

公开(公告)日：2021-07-13

申请号：US15940549

申请日：2018-03-29

Applicant: NIKON CORPORATION

Inventor： Jonathan Kyle Wells ,  Paul Derek Coon ,  Matthew D. Rosa ,  Johnathan Marquez ,  Michael B. Binnard ,  Steven Douglas Slonaker ,  Daniel Gene Smith ,  Stephen P. Renwick ,  Brett Herr

IPC: G03F7/20 ,  H02K41/03 ,  G01D5/347 ,  G03F9/00

Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.

公开(公告)号：US09639003B2

公开(公告)日：2017-05-02

申请号：US14523757

申请日：2014-10-24

Applicant: NIKON CORPORATION

Inventor： Steven Douglas Slonaker

IPC: G03B27/32 ,  G03B27/72 ,  G03F1/00 ,  G03F7/20 ,  B01L3/00 ,  G01N15/00 ,  G01N15/14

CPC classification number: G03F7/70083 ,  B01L3/5027 ,  B01L3/502707 ,  G01N15/1463 ,  G01N15/1475 ,  G01N2015/0065 ,  G03F7/70191 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/7035 ,  G03F7/70558 ,  G03F7/70583

Abstract: An imaging assembly for directing a pattern of energy at a workpiece includes (i) a reticle that defines a reticle array that includes a plurality of spaced apart, transmitting regions; (ii) an illumination source that generates an illumination beam; and (iii) a director assembly that selectively directs the illumination beam at the reticle array, the director assembly includes a plurality of director elements that are individually controlled to selectively control the beam pattern that is directed at the reticle array.

公开(公告)号：US20180217510A1

公开(公告)日：2018-08-02

申请号：US15940549

申请日：2018-03-29

Applicant: NIKON CORPORATION

Inventor： J. Kyle Wells ,  Paul Derek Coon ,  Matthew D. Rosa ,  Johnathan Marquez ,  Michael B. Binnard ,  Steven Douglas Slonaker ,  Daniel Gene Smith ,  Stephen P. Renwick ,  Brett Herr

IPC: G03F7/20 ,  G03F9/00 ,  H02K41/03 ,  G01D5/347

CPC classification number: G03F7/70725 ,  G01D5/347 ,  G01D5/34715 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7049 ,  H02K41/031 ,  H02K2201/18

Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.

公开(公告)号：US20180210332A1

公开(公告)日：2018-07-26

申请号：US15879286

申请日：2018-01-24

Applicant: Nikon Corporation

Inventor： Steven Douglas Slonaker ,  Stephen P. Renwick

IPC: G03F1/42 ,  H01L23/544 ,  H01L21/027 ,  G03F7/20 ,  G03F1/22

CPC classification number: G03F1/42 ,  G03F1/22 ,  G03F7/2004 ,  G03F9/7076 ,  H01L21/0274 ,  H01L22/20 ,  H01L22/30 ,  H01L23/544 ,  H01L2223/54426

Abstract: Alignment patterns that are selected based on device pattern spatial frequencies are defined on a reticle. The alignment patterns can include periodic arrays of lines, spaces, dots, of other pattern elements. Such patterns can be defined as sets associated with a common spatial frequency or frequency range, or some or all sets can include alignment marks having mark elements associated with different spatial frequencies.

公开(公告)号：US20150116682A1

公开(公告)日：2015-04-30

申请号：US14523757

申请日：2014-10-24

Applicant: NIKON CORPORATION

Inventor： Steven Douglas Slonaker

IPC: G03F7/20

CPC classification number: G03F7/70083 ,  B01L3/5027 ,  B01L3/502707 ,  G01N15/1463 ,  G01N15/1475 ,  G01N2015/0065 ,  G03F7/70191 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/7035 ,  G03F7/70558 ,  G03F7/70583

Abstract: An imaging assembly for directing a pattern of energy at a workpiece includes (i) a reticle that defines a reticle array that includes a plurality of spaced apart, transmitting regions; (ii) an illumination source that generates an illumination beam; and (iii) a director assembly that selectively directs the illumination beam at the reticle array, the director assembly includes a plurality of director elements that are individually controlled to selectively control the beam pattern that is directed at the reticle array.

Abstract translation: 用于在工件处引导能量图案的成像组件包括（i）限定包括多个间隔开的透射区域的掩模版阵列的掩模版; （ii）产生照明光束的照明源; 以及（iii）导向器组件，其选择性地引导照明光束在标线阵列处，导向器组件包括多个导向器元件，其被单独控制以选择性地控制指向掩模版阵列的光束图案。