公开(公告)号：US20040191652A1

公开(公告)日：2004-09-30

申请号：US10763383

申请日：2004-01-26

Applicant: Nova Measuring Instruments Ltd.

Inventor： Giora Dishon ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

IPC: G03F007/00

CPC classification number: G03F7/70058 ,  G01B11/14 ,  G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8867 ,  G03F7/3028 ,  G03F7/70525 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70675 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67155

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Abstract translation: 用于根据预定的光刻工艺处理衬底的设备包括其中装载衬底的装载站，其中衬底涂覆有光致抗蚀剂材料的涂覆站，其中光致抗蚀剂涂层通过掩模暴露于光的曝光站 具有预定图案以在光致抗蚀剂涂层上产生掩模的潜像，其中潜像显影的显影站，卸载基板的卸载站和用于相对于预定参数监测基板的监控站 的光刻工艺。

公开(公告)号：US20020171828A1

公开(公告)日：2002-11-21

申请号：US10184953

申请日：2002-07-01

Applicant: Nova Measuring Instruments Ltd.

Inventor： Yoel Cohen ,  Moshe Finarov

IPC: G01J003/28

CPC classification number: G03F7/70558

Abstract: A method and measuring tool are presented for automatic control of photoresist-based processing of a workpiece progressing through a processing tool arrangement. Spectrophotometric measurements are applied to the workpiece prior to being processed, spectral characteristics of the workpiece are measured, thereby obtaining measured data indicative of at least one parameter of the workpiece that defines an optimal value of at least processing time parameter of the processing tool to be used in the processing of said workpiece to obtain certain process results. This data is analyzed to determine data indicative of the optimal value of said at least processing time parameter, and thereby enable calculation of a correction value to be applied to said processing time parameter prior to applying the processing tool to the workpiece.

Abstract translation: 提出了一种方法和测量工具，用于自动控制通过加工工具布置进行的工件的基于光致抗蚀剂的处理。 在处理之前将分光光度测量值应用于工件，测量工件的光谱特性，从而获得指示工件的至少一个参数的测量数据，其将处理工具的至少处理时间参数的最佳值定义为 用于处理所述工件以获得一定的工艺结果。 分析该数据以确定指示所述至少处理时间参数的最佳值的数据，从而能够在将加工工具应用于工件之前计算要应用于所述处理时间参数的校正值。

公开(公告)号：US20020072003A1

公开(公告)日：2002-06-13

申请号：US09984640

申请日：2001-10-30

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boaz Brill ,  Yoel Cohen

IPC: G03F007/00 ,  G03F007/20 ,  G06F019/00 ,  G06F017/50

CPC classification number: G03F7/70491 ,  G03F7/705 ,  G03F7/70616 ,  H01L22/20

Abstract: A method is presented for controlling a process to be applied to a patterned structure in a production run. Reference data is provided being representative of diffraction signatures corresponding to a group of different fields in a structure similar to the patterned structure in the production line, and of a control window for the process parameters corresponding to a signature representative of desired process results. The group of different fields is characterized by different process parameters used in the manufacture of these fields. The method utilizes an expert system trained to be responsive to input data representative of a diffraction signature to provide output data representative of corresponding effective parameters of the process. Optical measurements are applied to different sites on the patterned structure in the production line to obtain diffraction signatures of thereof and generate corresponding measured data. The expert system analyses the measured data to determine effective parameters of the process applied to the patterned structure in the production line. The effective process parameters can then be analyzed to determine deviation thereof from corresponding nominal values, to thereby enable the process control.

Abstract translation: 提出了一种用于控制在生产运行中应用于图案化结构的工艺的方法。 提供了参考数据，其代表对应于类似于生产线中的图案化结构的结构中的一组不同场的衍射特征，以及对应于代表期望过程结果的签名的处理参数的控制窗口。 不同领域的组合的特征在于用于制造这些领域的不同工艺参数。 该方法利用受过训练的专家系统来响应代表衍射特征的输入数据，以提供代表该过程的相应有效参数的输出数据。 将光学测量应用于生产线上图案化结构上的不同位置，以获得其衍射特征并产生相应的测量数据。 专家系统分析测量数据，以确定应用于生产线上图案化结构的工艺的有效参数。 然后可以分析有效的工艺参数以确定其与相应的标称值的偏差，从而使得能够进行过程控制。

公开(公告)号：US20020033450A1

公开(公告)日：2002-03-21

申请号：US09942968

申请日：2001-08-31

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Moshe Finarov ,  Yoel Cohen

IPC: G21K007/00 ,  G01N023/00

CPC classification number: G01N21/956

Abstract: A method and system are presented for inspecting a structure containing a pattern in the form of a surface relief fabricated by a pattern-creating tool applied to the structure. Reference data is provided being indicative of photometric intensities of light components of different wavelengths returned from a structure having a pattern similar to the pattern of the structure under inspection. Spectrophotometric measurements are continuously applied to successive locations within the surface relief on the structure so as to form a measurement slice thereon. Measured data in the form of a spectrum indicative of photometric intensities of light components of different wavelengths returned from the successive locations within the slice is detected and analyzed to determine whether it correlates with the reference data in accordance with predetermined criteria results.

Abstract translation: 提出了一种方法和系统，用于检查包含由应用于结构的图案生成工具制成的表面浮雕形式的结构。 提供了参考数据，其指示从具有与被检查结构的图案类似的图案的结构返回的不同波长的光分量的光度强度。 分光光度测量连续地施加到结构上的表面浮雕内的连续位置，以便在其上形成测量切片。 检测并分析表示从切片内的连续位置返回的不同波长的光成分的光度强度的光谱的测量数据，以根据预定的标准结果来确定它是否与参考数据相关。