公开(公告)号：US20240111256A1

公开(公告)日：2024-04-04

申请号：US18339982

申请日：2023-06-22

Applicant: Onto Innovation Inc.

Inventor： Haodong Qiu ,  Zhuo Chen ,  Wei Ming Chiew ,  Jie Li ,  Jingsheng Shi ,  Shashank Srivastava

IPC: G05B13/02

CPC classification number: G05B13/0265 ,  G01N2201/126

Abstract: A machine learning model that uses composite metrology data determines at least one parameter of a device under test using measured metrology data from the device. The composite metrology data is generated by merging measured metrology data from a reference device with synthetic metrology data calculated from a model of the reference device. The composite metrology data may be generated further based on a synthetic metrology data calculated from a model for a modified reference device. The modified reference device may be generated using variations of at least one parameter of the model to expand the parameter space of the training range.