ANTI-SCATTER GRID
    1.
    发明申请
    ANTI-SCATTER GRID 审中-公开

    公开(公告)号:US20180268952A1

    公开(公告)日:2018-09-20

    申请号:US15546375

    申请日:2016-01-22

    Applicant: PLANSEE SE

    Abstract: An x-ray and/or gamma radiation absorbing slat, for use in an anti-scatter grid having a layer configuration, includes a film-shaped substrate of a metallic material on the basis of at least one heavy metal and at least one coating layer of a material on the basis of at least one metal from the group tin, antimony, tantalum, tungsten, rhenium, iridium, platinum, gold or bismuth. The material of the coating layer differs from the material of the film-shaped substrate. An anti-scatter grid for x-ray and/or gamma radiation, a method for producing an x-ray and/or gamma radiation absorbing slat and a method of producing an anti-scatter grid, are also provided.

    ADDITIVELY MANUFACTURED COMPONENT AND PRODUCTION METHOD THEREFOR

    公开(公告)号:US20200276639A1

    公开(公告)日:2020-09-03

    申请号:US16649770

    申请日:2018-09-24

    Applicant: PLANSEE SE

    Abstract: A component includes a multiplicity of individual powder particles of Mo, a Mo-based alloy, W or a W-based alloy that have been fused together to give a solid structure by a high-energy beam via an additive manufacturing method. The component has an oxygen content of not more than 0.1 at %. An additive manufacturing method includes producing the powder via the melt phase and providing a carbon content in the region of not less than 0.15 at %. The components are crack-free and have high grain boundary strength.

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