公开(公告)号：US3835007A

公开(公告)日：1974-09-10

申请号：US31485872

申请日：1972-12-13

Applicant: RHONE PROGIL

Inventor： FERAT A ,  MASOTTI R ,  CHAVANEL H

IPC: C23C14/14 ,  C23C14/02 ,  C23C14/16 ,  C23C28/02 ,  C23C15/00

CPC classification number: C23C28/023 ,  C23C14/021

Abstract: COPPER OR IRON ARE SECURELY BONDED TO TITANIUM OR TANTALUM SUBSTRATE METAL BY INITIALLY SUBJECTING THE SUBSTRATE METAL TO IONIC BOMBARDMENT IN WHICH THE SUBSTRATE METAL PERFORMS THE ROLE OF A CATHODE AND THEN TO CATHODE SPUTTERING IN WHICH THE SUBSTRATE METAL PERFORMS THE ROLE OF AN ANODE, AND THE COPPER OR IRON THE ROLE OF A CATHODE. THEREAFTER, THE BONDED COPPER OR IRON IS SUPPLEMENTED BY ADDITIONAL DEPOSITS BY CONVENTIONAL MEANS SUCH AS ELECTRODEPOSITION, ETC. SUPERIOR INDUSTRIAL PRODUCTS RESULTING FROM THE PROCESS ARE USEFUL AS ANODES IN ELECTROLYSIS CELLS AND AS HEAT EXCHANGERS.

公开(公告)号：US3779885A

公开(公告)日：1973-12-18

申请号：US3779885D

申请日：1971-06-15

Applicant: PROGIL

Inventor： LABEDAN P ,  MASOTTI R

IPC: C23C14/36 ,  C23C14/02 ,  C23C14/35 ,  C23C14/56 ,  C23F1/00 ,  H01J37/34 ,  H01M4/88 ,  C23C15/00

CPC classification number: H01J37/34 ,  C23C14/35 ,  H01M4/8871

Abstract: Apparatus and method for depositing thin layers by cathodic sputtering onto metallic supports wherein a rarefied gaseous enclosure is provided having an ionic bombardment stage and a cathodic sputtering stage with means for transferring the supports from the first stage to the second stage without cooling or admitting air, each stage acting simultaneously on both surfaces of the metal supports.

Abstract translation: 用于通过阴极溅射将薄层沉积到金属载体上的装置和方法，其中提供具有离子轰击级的稀薄气体外壳和具有用于将载体从第一级转移到第二级而不冷却或允许空气的装置的阴极溅射台， 每个阶段同时作用在金属支撑体的两个表面上。

公开(公告)号：US3813282A

公开(公告)日：1974-05-28

申请号：US21385171

申请日：1971-12-29

Applicant: PROGIL

Inventor： MASOTTI R ,  RIEUX J ,  BORREL P ,  LEHUREAU J

IPC: C04B20/02 ,  C08J5/06 ,  C22C49/14 ,  B32B3/00 ,  B32B5/02

CPC classification number: C08J5/06 ,  C04B20/02 ,  C22C49/14 ,  Y10T428/2918 ,  Y10T428/30 ,  Y10T428/31 ,  Y10T428/31504 ,  Y10T428/31511 ,  C04B14/386 ,  C04B14/026

Abstract: A CARBON SUBSTRATE IS SUBJECTED TO SUPERFICAL CATHODE SPUTTERING TO ALTER ITS SURFACE CHARACTERISTICS. CARBON SUBSTRATES THUS TREATED ARE USEFUL FOR THE FARBRICATION OF VARIOUS COMPOSITE ASSEMBLIES EXHIBTING IMPROVED PHYSICAL PROPER TIES, SUCH AS ENHANCED MECHANICAL STRENGTH.

公开(公告)号：US3773639A

公开(公告)日：1973-11-20

申请号：US3773639D

申请日：1971-04-05

Applicant: PROGIL

Inventor： MASOTTI R

IPC: C23C14/00 ,  C23C14/02 ,  C23C14/16 ,  C25B11/04 ,  H01J49/48 ,  C23C15/00

CPC classification number: H01J49/488 ,  C23C14/0036 ,  C23C14/022 ,  C23C14/165 ,  C25B11/0442 ,  C25B11/0473

Abstract: A process for depositing a precious metal or its oxide on a metallic support by first submitting the metallic support to ionic bombardment in a rare gas atmosphere, then without cooling below 300*C. depositing the precious metal by cathodic sputtering conducted first in a rare gas atmosphere and then in an atmosphere of mixed oxygen and rare gas.