公开(公告)号：US20140266244A1

公开(公告)日：2014-09-18

申请号：US14214958

申请日：2014-03-16

Applicant: Photon Dynamics Inc.

Inventor： Viacheslav MINAEV ,  Raul Albert MARTIN ,  Thomas E. WISHARD ,  Michael Sean CASSADY ,  Jongho LEE ,  Thomas H. BAILEY ,  Sriram KRISHNASWAMI

IPC: G01R31/28

CPC classification number: G09G3/006 ,  G09G3/3611

Abstract: Described are techniques for maintaining reliable and reproducible conditions for panel inspection, i.e. pixel and line defect detection, while at the same time preventing large-scale panel damage. One implementation involves an apparatus for identifying a defect in an electronic circuit incorporating a circuit driving module configured to apply an electrical test signal to the electronic circuit; a defect detection module configured to identify the defect in the electronic circuit based at least on the applied electrical test signal; a signal monitoring module configured to measure the electrical test signal at the electronic circuit; and a control module operatively coupled to the signal monitoring module and the circuit driving module and configured to control at least the circuit driving module based on the electrical test signal measured at the electronic circuit.

Abstract translation: 描述了用于维持面板检查的可靠和可再现的条件的技术，即像素和线缺陷检测，同时防止大规模面板损坏。 一种实施方式涉及一种用于识别电子电路中的缺陷的装置，该电子电路包括被配置为向电子电路施加电测试信号的电路驱动模块; 缺陷检测模块，被配置为至少基于所应用的电测试信号来识别所述电子电路中的缺陷; 信号监测模块，被配置为测量所述电子电路处的电测试信号; 以及控制模块，其可操作地耦合到所述信号监测模块和所述电路驱动模块，并且被配置为基于在所述电子电路处测量的所述电测试信号来至少控制所述电路驱动模块。

公开(公告)号：US20170294291A1

公开(公告)日：2017-10-12

申请号：US15512529

申请日：2015-09-17

Applicant: ORBOTECH LTD. ,  PHOTON DYNAMICS, INC.

Inventor： Nedal SALEH ,  Unit B STERLING ,  Daniel TOET ,  Arie GLAZER ,  Ronen LOEWINGER ,  Sriram KRISHNASWAMI

IPC: H01J37/32

CPC classification number: H01J37/32825 ,  H05H2240/10

Abstract: An electron-beam induced plasma is utilized to establish a non-mechanical, electrical contact to a device of interest. This plasma source may be referred to as atmospheric plasma source and may be configured to provide a plasma column of very fine diameter and controllable characteristics. The plasma column traverses the atmospheric space between the plasma source into the atmosphere and the device of interest and acts as an electrical path to the device of interest in such a way that a characteristic electrical signal can be collected from the device. Additionally, by controlling the gases flowing into the plasma column the probe may be used for surface modification, etching and deposition.