公开(公告)号：US11518675B2

公开(公告)日：2022-12-06

申请号：US17126316

申请日：2020-12-18

Applicant: Purdue Research Foundation

Inventor： Chi Hwan Lee ,  Zahyun Ku ,  Augustine Michael Urbas ,  Bongjoong Kim

IPC: B82B3/00 ,  B82Y40/00 ,  G02B5/00 ,  B82Y30/00

Abstract: Nanoassembly methods for producing quasi-3D plasmonic films with periodic nanoarrays of nano-sized surface features. A sacrificial layer is deposited on a surface of a donor substrate having periodic nanoarrays of nanopattern features formed thereon. A plasmon film is deposited onto the sacrificial layer and a dielectric spacer is deposited on the plasmon film. The donor substrate having the sacrificial layer, plasmon film, and dielectric spacer thereon is immersed in a bath of etchant to selectively remove the sacrificial layer such that the plasmon film and the dielectric spacer thereon adhere to the surface of the donor substrate. The dielectric spacer and the plasmon film are mechanically separated from the donor substrate to define a quasi-three dimensional (3D) plasmonic film having periodic nanoarrays of nano-sized surface features defined by the nanopattern features of the donor substrate surface. The quasi-3D plasmonic film is then applied to a receiver substrate.

公开(公告)号：US20230117159A1

公开(公告)日：2023-04-20

申请号：US18061052

申请日：2022-12-02

Applicant: Purdue Research Foundation

Inventor： Chi Hwan Lee ,  Zahyun Ku ,  Augustine Michael Urbas ,  Bongjoong Kim

IPC: B82B3/00 ,  G02B5/00

Abstract: Nanoassembly methods for producing quasi-3D plasmonic films with periodic nanoarrays of nano-sized surface features. A sacrificial layer is deposited on a surface of a donor substrate having periodic nanoarrays of nanopattern features formed thereon. A plasmon film is deposited onto the sacrificial layer and a dielectric spacer is deposited on the plasmon film. The donor substrate having the sacrificial layer, plasmon film, and dielectric spacer thereon is immersed in a bath of etchant to selectively remove the sacrificial layer such that the plasmon film and the dielectric spacer thereon adhere to the surface of the donor substrate. The dielectric spacer and the plasmon film are mechanically separated from the donor substrate to define a quasi-three dimensional (3D) plasmonic film having periodic nanoarrays of nano-sized surface features defined by the nanopattern features of the donor substrate surface. The quasi-3D plasmonic film is then applied to a receiver substrate.

公开(公告)号：US20220363860A1

公开(公告)日：2022-11-17

申请号：US17742186

申请日：2022-05-11

Applicant: Purdue Research Foundation

Inventor： Craig J. Goergen ,  Chi Hwan Lee ,  Bongjoong Kim ,  Kwan-Soo Lee

IPC: C08J9/40 ,  C08G77/12 ,  C08G77/06 ,  C08K3/08 ,  C08J9/12 ,  C08J3/24

Abstract: Poroelastic materials, methods of making such materials, biosensors comprising such materials, and methods of making and using such biosensors. According to one aspect, a poroelastic material is formed by a process that includes depositing a prepolymer composition on a substrate, annealing the prepolymer composition in a pressurized steam environment at a temperature and for a duration sufficient to form a porous medium having a solid matrix formed of a polymer derived from the prepolymer composition, infiltrating the porous medium with a liquid that includes electrically conductive nanomaterials such that the electrically conductive nanomaterials are located within pores of the porous medium, and evaporating the liquid such that the electrically conductive nanomaterials remain in and/or connected through the pores of the porous medium.

公开(公告)号：US20210229987A1

公开(公告)日：2021-07-29

申请号：US17126316

申请日：2020-12-18

Applicant: Purdue Research Foundation

Inventor： Chi Hwan Lee ,  Zahyun Ku ,  Augustine Michael Urbas ,  Bongjoong Kim

IPC: B82B3/00 ,  G02B5/00

Abstract: Nanoassembly methods for producing quasi-3D plasmonic films with periodic nanoarrays of nano-sized surface features. A sacrificial layer is deposited on a surface of a donor substrate having periodic nanoarrays of nanopattern features formed thereon. A plasmon film is deposited onto the sacrificial layer and a dielectric spacer is deposited on the plasmon film. The donor substrate having the sacrificial layer, plasmon film, and dielectric spacer thereon is immersed in a bath of etchant to selectively remove the sacrificial layer such that the plasmon film and the dielectric spacer thereon adhere to the surface of the donor substrate. The dielectric spacer and the plasmon film are mechanically separated from the donor substrate to define a quasi-three dimensional (3D) plasmonic film having periodic nanoarrays of nano-sized surface features defined by the nanopattern features of the donor substrate surface. The quasi-3D plasmonic film is then applied to a receiver substrate.

公开(公告)号：US20240367398A1

公开(公告)日：2024-11-07

申请号：US18048596

申请日：2022-10-21

Applicant: Purdue Research Foundation

Inventor： Chi Hwan Lee ,  Bongjoong Kim ,  Zahyun Ku ,  Augustine Urbas ,  Jehwan Hwang

IPC: B29D11/00 ,  B29K33/00 ,  B29K63/00 ,  G02B5/20

Abstract: Methods of fabricating infrared bandpass filters and infrared bandpass filters fabricated thereby. The methods include forming metallic and dielectric spacer layers on a mold that defines nanoscale-sized recesses or protuberances, depositing a stress-absorbing layer on the dielectric spacer layer opposite the mold, and applying a force to the stress-absorbing layer to peel a first intermediate structure comprising the metallic layer, the dielectric spacer layer, and the stress-absorbing layer from the mold. The stress-absorbing layer may be dissolved from the first intermediate structure with a solvent to define a second intermediate structure. The second intermediate structure may be transferred to a receiver substrate to define the IR bandpass filter. The recesses or protuberances of the metallic and dielectric spacer layers are configured to function as quasi-three-dimensional (quasi-3D) plasmonic metal-dielectric hybrid nanostructures.

公开(公告)号：US11802043B2

公开(公告)日：2023-10-31

申请号：US18061052

申请日：2022-12-02

Applicant: Purdue Research Foundation

Inventor： Chi Hwan Lee ,  Zahyun Ku ,  Augustine Michael Urbas ,  Bongjoong Kim

IPC: B82B3/00 ,  B82Y40/00 ,  G02B5/00 ,  B82Y30/00

CPC classification number: B82B3/0014 ,  G02B5/008 ,  B82Y30/00 ,  B82Y40/00 ,  G02B2207/101

Abstract: Nanoassembly methods for producing quasi-3D plasmonic films with periodic nanoarrays of nano-sized surface features. A sacrificial layer is deposited on a surface of a donor substrate having periodic nanoarrays of nanopattern features formed thereon. A plasmon film is deposited onto the sacrificial layer and a dielectric spacer is deposited on the plasmon film. The donor substrate having the sacrificial layer, plasmon film, and dielectric spacer thereon is immersed in a bath of etchant to selectively remove the sacrificial layer such that the plasmon film and the dielectric spacer thereon adhere to the surface of the donor substrate. The dielectric spacer and the plasmon film are mechanically separated from the donor substrate to define a quasi-three dimensional (3D) plasmonic film having periodic nanoarrays of nano-sized surface features defined by the nanopattern features of the donor substrate surface. The quasi-3D plasmonic film is then applied to a receiver substrate.