公开(公告)号：US3923566A

公开(公告)日：1975-12-02

申请号：US26483372

申请日：1972-06-21

Applicant: RCA CORP

Inventor： LAW HAROLD BELL

IPC: C23F1/04 ,  H01J9/14 ,  H01J29/07 ,  C23F1/02

CPC classification number: C23F1/04 ,  H01J9/142 ,  H01J29/07 ,  Y10T29/49812

Abstract: A metal sheet is embossed by a special embossing tool to provide regions in the sheet of minimum thickness at the intended aperture locations thereon. Following embossing, the sheet is shaped into a desired mask contour and the embossed side of the sheet is coated with a stop-off substance to prevent subsequent removal of material from that side. The regions of minimum thickness are then removed, such as by etching the uncoated side of the sheet, to provide the apertures.

Abstract translation: 通过特殊压花工具对金属板进行压花，以在其上的预定孔径位置处提供最小厚度的片材区域。 在压花之后，将片材成形为期望的掩模轮廓，并且片材的压纹侧涂覆有停止物质以防止随后从该侧移除材料。 然后去除最小厚度的区域，例如通过蚀刻片材的未涂覆侧面以提供孔。

公开(公告)号：US3631576A

公开(公告)日：1972-01-04

申请号：US3631576D

申请日：1970-03-17

Applicant: RCA CORP

Inventor： LAW HAROLD BELL ,  LEE RAY HUI-CHUNG

IPC: H01J9/14 ,  H01J9/16 ,  H01J9/44

CPC classification number: H01J9/144

Abstract: A method for producing a color kinescope having an image screen and a color-selection mask comprising final-size apertures. The method includes the steps of providing at least one perforated resist layer on a metal substrate and removing through the perforations of the resist layer both certain portions of the substrate so as to provide corridors of a given size through the substrate and other portions of the substrate adjacent to the corridors, so as to provide recesses extending only partially through the substrate thereby producing a preliminary mask. The image screen is produced with the preliminary mask, and, then, portions of the substrate located beneath the various recesses are removed so as to produce a color-selection mask comprising final-size apertures of larger size than the corridors. The color selection mask is then incorporated in a kinescope.

Abstract translation: 一种用于制造具有图像屏幕和包括最终尺寸孔径的颜色选择掩模的彩色显像管的方法。 该方法包括以下步骤：在金属基底上提供至少一个穿孔的抗蚀剂层，并且通过基底的某些部分去除抗蚀剂层的穿孔，从而通过基底和基底的其它部分提供给定尺寸的走廊 邻近走廊，以便提供仅部分延伸通过基底的凹槽，从而产生预备掩模。 用初步掩模制造图像屏幕，然后去除位于各种凹部下方的基板的部分，以便产生包括比走廊尺寸更大的最终尺寸的孔的选色掩模。 然后将颜色选择面罩并入显像管。

公开(公告)号：US3878007A

公开(公告)日：1975-04-15

申请号：US36754173

申请日：1973-06-06

Applicant: RCA CORP

Inventor： FELDSTEIN NATHAN ,  LAW HAROLD BELL

IPC: C23C18/16 ,  G03F1/72 ,  H05K1/03 ,  H05K3/06 ,  H05K3/10 ,  H05K3/18 ,  H05K3/22 ,  B29C17/08

CPC classification number: G03F1/72 ,  C23C18/1608 ,  C23C18/1689 ,  H05K1/0306 ,  H05K3/062 ,  H05K3/108 ,  H05K3/181 ,  H05K3/225 ,  H05K2201/0344 ,  H05K2203/0542 ,  H05K2203/072

Abstract: The method comprises depositing a thin layer of a first metal having a relatively high degree of solubility in a particular etchant on a substrate, this first metal being catalytic to electroless deposition of a second metal to be subsequently deposited, electrolessly depositing on the first metal a pattern of areas of a second metal which has a relatively low degree of solubility in the etchant, and then treating the plated areas with the etchant, so that the first metal is removed where it is not covered by the second metal but the second metal is substantially unaffected.

Abstract translation: 该方法包括在衬底上的特定蚀刻剂中沉积具有较高溶解度的第一金属薄层，该第一金属被催化以无序沉积待随后沉积的第二金属，无电沉积在第一金属a上 在蚀刻剂中具有相对低的溶解度的第二金属的区域图案，然后用蚀刻剂处理镀覆区域，使得第一金属在不被第二金属覆盖的地方被除去，但第二金属是 基本上不受影响。