PHOTO-ALIGNABLE POSITIVE C-PLATE RETARDER

    公开(公告)号:US20220163853A1

    公开(公告)日:2022-05-26

    申请号:US17597446

    申请日:2020-07-20

    Abstract: The present invention relates to material compositions and methods for generating photo-alignable positive c-plate retarders. Because a planar alignment direction can be induced in the surface of the above c-plate retarder by exposure to polarized light, a slave material can be aligned on the surface of the c-plate retarder with a defined azimuthal orientation direction, without the need of an additional orientation layer.

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