公开(公告)号：US20140021364A1

公开(公告)日：2014-01-23

申请号：US13905559

申请日：2013-05-30

Applicant: Rigaku Corporation

Inventor： Kazuki ITO ,  Yoshinori UEJI ,  Koichi KAJIYOSHI ,  Kunio NISHI

IPC: G01T1/17

CPC classification number: G01T1/17

Abstract: An X-ray analysis apparatus converts an X-ray intensity distribution of discrete data determined for each pixel, from a first plane where the distribution is known into a second plane where the distribution is not known. The X-ray analysis apparatus projects onto the second plane, a grid point which specifies a pixel on the first plane and an intermediate point between the grid points, as nodes, calculates an area of a region where a polygon expressing a projected pixel specified by the projected nodes overlaps with each pixel on the second plane, to thereby calculate an occupancy ratio of the polygon expressing the projected pixel to each pixel on the second plane and distributes X-ray intensity in the pixel on the first plane to the pixel on the second plane based on the occupancy ratio, to thereby convert the X-ray intensity distribution.

Abstract translation: X射线分析装置将从每个像素确定的离散数据的X射线强度分布从分布已知的第一平面转换为分布未知的第二平面。 X射线分析装置投射到第二平面上，指定第一平面上的像素的网格点和作为节点的网格点之间的中间点，计算区域的区域，其中表示由 投影节点与第二平面上的每个像素重叠，从而计算出表示投影像素的多边形与第二平面上的每个像素的占有率，并将第一平面上的像素中的X射线强度分配给第二平面上的像素 基于占有率的第二平面，从而转换X射线强度分布。

公开(公告)号：US20170074809A1

公开(公告)日：2017-03-16

申请号：US15259581

申请日：2016-09-08

Applicant: Rigaku Corporation

Inventor： Kazuki ITO ,  Kazuhiko OMOTE ,  Licai Jiang

IPC: G01N23/201

Abstract: Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.

Abstract translation: 本发明提供一种X射线小角度光学系统，其容易实现期望的角度分辨率，包括：具有微焦点的X射线源; 多层反射镜，具有椭圆反射面，并且被配置为收集从X射线源发射的X射线并照射样品; 以及X射线检测器，被配置为检测从样品产生的散射的X射线，其中多层反射镜的椭圆反射表面具有焦点A和焦点B，其中X射线源被布置成使得 微焦点包括焦点A，其中X射线检测器布置在焦点B的多层反射镜侧。

公开(公告)号：US20210200922A1

公开(公告)日：2021-07-01

申请号：US17132095

申请日：2020-12-23

Applicant: Rigaku Corporation

Inventor： Tomoyuki IWATA ,  Kazuhiko OMOTE ,  Kazuki ITO ,  Tetsuya OZAWA

IPC: G06F30/25 ,  G01N23/201

Abstract: Provided is a scattering measurement analysis method including obtaining a theoretical scattering intensity from a structural model that contains a lot of scatterers, wherein the obtaining of a theoretical scattering intensity includes obtaining a contribution to the theoretical scattering intensity of a pair of a scatterer “m” and a scatterer “n” existing at a distance “r” from the scatterer “m” among a plurality of scatterers by at least one of calculations in accordance with the distance “r”, the calculations including a first calculation of calculating contributions of the scatterer “m” and the scatterer “n” from respective scattering factors fm(q) and fn*(q) and a center-to-center distance rmn between the scatterer “m” and the scatterer “n”, and a second calculation of substituting the scattering factor fn*(q) of the scatterer “n” by a first representative value and substituting a probability density function of the number of scatterers existing at the distance “r” by a constant value.

公开(公告)号：US20240120036A1

公开(公告)日：2024-04-11

申请号：US18373967

申请日：2023-09-28

Applicant: Rigaku Corporation

Inventor： Masatsugu YOSHIMOTO ,  Kazuhiko OMOTE ,  Kazuki ITO

IPC: G16C60/00 ,  G01N23/20016

CPC classification number: G16C60/00 ,  G01N23/20016

Abstract: A processing apparatus for processing a structure factor including total scattering data and data of a structural model are provided comprises a structure factor acquiring section for acquiring a first structure factor based on measured total scattering data; a data converting section for separating the first structure factor into a short-range correlation and a long-range correlation; and a scattering intensity calculating section for acquiring a structural model indicating an atomic arrangement in a finite region, calculating a short-range scattering intensity of the structural model and calculating a second structure factor from the short-range scattering intensity and the long-range correlation.