Abstract:
A micromechanical component includes: a substrate; a seismic weight joined to the substrate at a first suspension mount; at least one first electrode for measuring a motion of the seismic weight in a first direction, the first electrode being joined to the substrate at a second suspension mount; and at least one second electrode for measuring a motion of the seismic weight in a second direction different from the first direction, the second electrode being joined to the substrate at a third suspension mount. The first electrode is mechanically connected to the second suspension mount with the aid of a support arm and set apart from the second suspension mount.
Abstract:
A micromechanical acceleration sensor is provided, including a substrate, a first seismic mass, which is movably suspended on the substrate and deflectable in an acceleration acting on the substrate in a first direction, first detection means for detecting a deflection of the first seismic mass in an acceleration acting on the substrate in the first direction, a second seismic mass, which is movably suspended on the substrate and deflectable in an acceleration acting on the substrate in a second direction, the second direction running perpendicularly to the first direction, second detection means for detecting a deflection of the second seismic mass in an acceleration acting on the substrate in the second direction, the second seismic mass furthermore being deflectable in an acceleration acting on the substrate in a third direction, the third direction running perpendicularly to the first direction and to the second direction, and third detection means for detecting a deflection of the second seismic mass in an acceleration acting on the substrate in the third direction.
Abstract:
A method for manufacturing a MEMS element, including the following: forming a least one stationary weight element and at least one moving weight element in the MEMS element, and positioning at least one fixing element at the stationary weight element and at the moving weight element, the fixing element being formed so as to be able to be severed.
Abstract:
Method for on-chip stress decoupling to reduce stresses in a vertical hybrid integrated component including MEMS and ASIC elements and to mechanical decoupling of the MEMS structure. The MEMS/ASIC elements are mounted above each other via at least one connection layer and form a chip stack. On the assembly side, at least one connection area is formed for the second level assembly and for external electrical contacting of the component on a component support. At least one flexible stress decoupling structure is formed in one element surface between the assembly side and the MEMS layered structure including the stress-sensitive MEMS structure, in at least one connection area to the adjacent element component of the chip stack or to the component support, the stress decoupling structure being configured so that the connection material does not penetrate into the stress decoupling structure and flexibility of the stress decoupling structure is ensured.