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公开(公告)号:US20240264528A1
公开(公告)日:2024-08-08
申请号:US18537020
申请日:2023-12-12
Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Inventor: Sheng LIU , Iou-Sheng KE , Keren ZHANG , James F. CAMERON , Shintaro YAMADA , Li CUI
IPC: G03F7/11 , C07C43/285 , C07C49/255 , C07C317/22
CPC classification number: G03F7/11 , C07C43/285 , C07C49/255 , C07C317/22
Abstract: Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):
wherein: R1 is each independently H, C1-30 alkyl, or C3-30 cycloalkyl; Ar1 is an aromatic ring or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar1 is substituted or unsubstituted; Ar2 is an aromatic ring chosen from a 6-membered carbocyclic aromatic ring, a 5- or 6-membered heteroaromatic ring, or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar2 optionally comprises a fused cyclic imide moiety, a fused oxazole moiety, a fused imidazole moiety, or a fused thiazole moiety, and wherein Ar2 is substituted or unsubstituted; Y1 is a single covalent bond, or is selected from —O—, —C(O)—, —C(O)O—, —S—, —S(O)2—, —N(R2)—, —C(O)N(R2)—, —C(O)N(R2)C(O)—, —(CH2)y—, or a combination thereof, wherein R2 is H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(O)R3, or S(O)2R3, wherein R3 is chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl, and y is an integer from 1 to 6; x is an integer from 2 to 5; and * denotes a binding site to a part of the curable compound other than the group represented by formula (1), provided that no two
groups are in an ortho position to each other on Ar1, wherein ** denotes the point of attachment to an aromatic ring carbon of Ar1; and
a solvent.-
公开(公告)号:US20210343522A1
公开(公告)日:2021-11-04
申请号:US17231339
申请日:2021-04-15
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Sheng Liu , James F. CAMERON , Iou-Sheng KE , Shintaro YAMADA , Li CUI
IPC: H01L21/027 , C09D163/00 , G03F7/11 , G03F7/00 , G03F7/09 , G03F7/075
Abstract: Coating compositions comprise: a B-staged reaction product of one or more compounds comprising: a core chosen from C6-50 carbocyclic aromatic, C2-50 heterocyclic aromatic, C1-20 aliphatic, C1-20 heteroaliphatic, C3-20 cycloaliphatic, and C2-20 heterocycloaliphatic, each of which may be substituted or unsubstituted; and two or more substituents of formula (1) attached to the core: wherein: Ar1 is an aromatic group independently chosen from C6-50 carbocyclic aromatic and C2-50 heteroaromatic, each of which may be substituted or unsubstituted; Z is a substituent independently chosen from OR1, protected hydroxyl, carboxyl, protected carboxyl, SR1, protected thiol, —O—C(═O)—C1-6 alkyl, halogen, and NHR2; wherein each R1 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl; each R2 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(═O)—R1, and S(═O)2—R1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar1; and * denotes the point of attachment to the core; provided that when the core comprises an aromatic ring, no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
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公开(公告)号:US20170073453A1
公开(公告)日:2017-03-16
申请号:US15363114
申请日:2016-11-29
Inventor: Li CUI , Sung Wook CHO , Mingqi LI , Shintaro YAMADA , Peter TREFONAS, III , Robert L. AUGER
IPC: C08G8/04 , G03F7/16 , G03F7/09 , G03F7/26 , C09D161/06 , H01L21/311 , G03F7/20
CPC classification number: C08G8/04 , C08G8/08 , C09D161/06 , G03F7/091 , G03F7/094 , G03F7/16 , G03F7/168 , G03F7/2002 , G03F7/26 , H01L21/31111 , H01L21/31144
Abstract: Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
Abstract translation: 某些芳族醇与某些芳族醛的聚合反应产物可用作半导体制造工艺中的底层。
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公开(公告)号:US20150166711A1
公开(公告)日:2015-06-18
申请号:US14569610
申请日:2014-12-12
Inventor: Li CUI , Sung Wook CHO , Mingqi LI , Shintaro YAMADA , Peter TREFONAS, III , Robert L. AUGER
IPC: C08G8/04 , H01L21/311
CPC classification number: C08G8/04 , C08G8/08 , C09D161/06 , G03F7/091 , G03F7/094 , G03F7/16 , G03F7/168 , G03F7/2002 , G03F7/26 , H01L21/31111 , H01L21/31144
Abstract: Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
Abstract translation: 某些芳族醇与某些芳族醛的聚合反应产物可用作半导体制造工艺中的底层。
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