公开(公告)号：US20230089440A1

公开(公告)日：2023-03-23

申请号：US17932198

申请日：2022-09-14

Applicant: SAGE ELECTROCHROMICS, INC.

Inventor： Robert Newcomb ,  Benjamin Edward Treml ,  Cody VanDerVeen

IPC: G02F1/1524

Abstract: An electrochromic device is disclosed. The electrochromic device can include a stack of layers. The stack of layers can include a first transparent conductive layer on a substrate, a second transparent conductive layer, a cathodic electrochromic layer between the first transparent conductive layer and the second transparent conductive layer, and an anodic electrochromic layer between the first transparent conductive layer and the second transparent conductive layer. The stack of layers can be patterned. In one embodiment, the pattern can be parallel to a voltage gradient of the electrochromic device. In another embodiment, the pattern can extend through all layers of the stack of layers of the electrochromic device.

公开(公告)号：US11947233B2

公开(公告)日：2024-04-02

申请号：US17135739

申请日：2020-12-28

Applicant: SAGE Electrochromics, Inc.

Inventor： Benjamin Treml ,  Jean-Christophe Giron ,  Yigang Wang ,  Robert Newcomb

IPC: G02F1/155 ,  B23K26/352 ,  B23K26/362 ,  G02F1/153

CPC classification number: G02F1/155 ,  G02F1/1533 ,  B23K26/355 ,  B23K26/362

Abstract: Various embodiments relate to an electrochromic (EC) device that is structured with surface contour features arranged according to a randomized pattern. For example, one or more conductive layers of an EC device may be structured with such surface ablations. In some embodiments, the randomized ablation pattern may comprise a randomized variation in one or more geometrical characteristics of a group of segments. In some examples, the geometrical characteristic(s) may include a distance characteristic, an orientation characteristic, and/or a shape characteristic, etc. According to various embodiments, the randomized ablation pattern may be configured to reduce diffraction and/or scatter of light incident on the surface ablations as compared to some other ablation patterns.

公开(公告)号：US11567384B2

公开(公告)日：2023-01-31

申请号：US16192876

申请日：2018-11-16

Applicant: SAGE ELECTROCHROMICS, INC.

Inventor： Wen Li ,  Florent Martin ,  Jean-Christophe Giron ,  Robert Newcomb ,  Erik Jon Bjornard

IPC: G02F1/155 ,  G02F1/15 ,  E06B3/66 ,  G02F1/1516 ,  G02F1/1523 ,  G02F1/163

Abstract: A non-light-emitting, variable transmission device can include a first substrate, a first transparent conductive layer, an electrochromic layer, a second transparent conductive layer, a second substrate; and an interlayer disposed between the first substrate and the second substrate. The non-light-emitting, variable transmission device is configured such that a failure of the non-light-emitting, variable transmission device is less likely than another non-light-emitting, variable transmission device in which the interlayer directly contacts the second transparent conductive layer and has a moisture content of at least 0.08 wt %. In an embodiment, the interlayer has a moisture content of at most 0.05 wt %. In another embodiment, the non-light emitting, variable transmission device further includes a barrier layer disposed between the second transparent conductive layer and the interlayer, wherein the barrier layer extends at least partly through the second transparent conductive layer or seals off a passageway.

公开(公告)号：US20210200052A1

公开(公告)日：2021-07-01

申请号：US17135739

申请日：2020-12-28

Applicant: SAGE Electrochromics, Inc.

Inventor： Benjamin Treml ,  Jean-Christophe Giron ,  Yigang Wang ,  Robert Newcomb

IPC: G02F1/153 ,  B23K26/57 ,  G02F1/1523

Abstract: Various embodiments relate to an electrochromic (EC) device that is structured with surface contour features arranged according to a randomized pattern. For example, one or more conductive layers of an EC device may be structured with such surface ablations. In some embodiments, the randomized ablation pattern may comprise a randomized variation in one or more geometrical characteristics of a group of segments. In some examples, the geometrical characteristic(s) may include a distance characteristic, an orientation characteristic, and/or a shape characteristic, etc. According to various embodiments, the randomized ablation pattern may be configured to reduce diffraction and/or scatter of light incident on the surface ablations as compared to some other ablation patterns.