Abstract:
Disclosed herein is an apparatus for coating a substrate, including a horizontal coating unit having an inlet and an outlet through which a substrate is moving in and out horizontally, and coating surfaces of the substrate with coating liquid by horizontal dipping method to form a protective layer; and a squeegee unit arranged outside the outlet of the horizontal coating unit and being in close contact with the protective layer of the substrate moving out of the horizontal coating unit through the outlet to uniformize coating thickness of the protective layer.According to the present invention, coating thickness of a protective layer coated on a substrate is formed uniformly, and in particular coating quality of edges of the substrate is improved. Therefore, it is possible to minimize foreign substances introduced during manufacturing process of the substrate, thereby reducing defective rate due to foreign substances and improving productivity.