公开(公告)号：US20160300697A1

公开(公告)日：2016-10-13

申请号：US15100388

申请日：2014-11-28

Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION

Inventor： Ki Woong Whang ,  Hee Woon Cheong

IPC: H01J37/32

CPC classification number: H01J37/321 ,  H01J37/3266 ,  H01J37/32669

Abstract: A plasma processing device capable of plasma shaping through magnetic field control includes: a vacuum chamber having an inner space on which a substrate is mounted; an antenna positioned on the upper portion of the chamber and generating plasma in the inner space of the chamber; a magnetic field generation unit including a first magnetic field generation unit disposed on the lower portion of the chamber and including one or more electromagnetic coils and a second magnetic field generation unit including one or more electromagnetic coils disposed on the side of the chamber; and a control unit controlling current input into the electromagnetic coils of the magnetic field generation unit.

Abstract translation: 能够通过磁场控制进行等离子体成形的等离子体处理装置包括：真空室，其具有安装有基板的内部空间; 定位在所述腔室的上部并且在所述腔室的内部空间中产生等离子体的天线; 磁场产生单元，其包括设置在所述室的下部并且包括一个或多个电磁线圈的第一磁场产生单元和包括设置在所述室侧的一个或多个电磁线圈的第二磁场产生单元; 以及控制单元，控制电流输入到磁场产生单元的电磁线圈中。

公开(公告)号：US09728377B2

公开(公告)日：2017-08-08

申请号：US15100388

申请日：2014-11-28

Applicant: Seoul National University R&DB Foundation

Inventor： Ki Woong Whang ,  Hee Woon Cheong

IPC: H01J37/32

CPC classification number: H01J37/321 ,  H01J37/3266 ,  H01J37/32669

Abstract: A plasma processing device capable of plasma shaping through magnetic field control includes: a vacuum chamber having an inner space on which a substrate is mounted; an antenna positioned on the upper portion of the chamber and generating plasma in the inner space of the chamber; a magnetic field generation unit including a first magnetic field generation unit disposed on the lower portion of the chamber and including one or more electromagnetic coils and a second magnetic field generation unit including one or more electromagnetic coils disposed on the side of the chamber; and a control unit controlling current input into the electromagnetic coils of the magnetic field generation unit.