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1.
公开(公告)号:US20240010803A1
公开(公告)日:2024-01-11
申请号:US18337037
申请日:2023-06-19
Applicant: SK microworks Co., Ltd.
Inventor: Hak Soo LEE , Sang Hun CHOI , Jin Woo LEE
CPC classification number: C08J5/18 , C08G69/42 , C08K7/18 , C08J2377/10 , C08G2220/00 , C08K2201/003 , C08K2201/011
Abstract: The embodiments relate to a polyamide-based film that is excellent in solvent resistance and optical properties, to a process for preparing the same, and to a cover window and a display device comprising the same. The polyamide-based film comprises a polyamide-based polymer, wherein when the 3D surface roughness of a first side of the film is measured, the volume (natural volume) between the surface and a reference plane placed at the elevation of the highest peak parallel to the surface plane is 100 μm3 to 2,800 μm3.
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2.
公开(公告)号:US20230287192A1
公开(公告)日:2023-09-14
申请号:US18107439
申请日:2023-02-08
Applicant: SK microworks Co., Ltd.
Inventor: Sang Hun CHOI , Hak Soo LEE , Jin Woo LEE
IPC: C08J7/043 , C09D175/04 , C09D167/00
CPC classification number: C08J7/043 , C09D175/04 , C09D167/00 , C08J2377/10 , C08J2467/00 , C08J2375/04
Abstract: In the multilayer film provided with a primer layer of a specific composition comprising a polyester-based resin on a polyamide-based base layer, the adhesive strength with a hard coating layer and an OCA layer to be coated on the surface thereof is excellent, as well as the optical and mechanical properties are also excellent.
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