公开(公告)号：US09246116B2

公开(公告)日：2016-01-26

申请号：US14149529

申请日：2014-01-07

Applicant: SNU R&DB FOUNDATION

Inventor： Changhee Lee ,  Kookheon Char ,  Seonghoon Lee ,  Donggu Lee ,  Jaehoon Lim ,  Jiyun Song

IPC: H01L21/00 ,  H01L51/42 ,  B82Y40/00

CPC classification number: H01L51/426 ,  B82Y40/00 ,  Y02E10/549 ,  Y02P70/521

Abstract: An exemplary method of manufacturing a light-absorbing layer and a method of manufacturing a semiconductor device including the same light-absorbing layer are provided. The exemplary method includes: forming a nanoparticles film by applying a semiconductor nanoparticles solution on a substrate; thermally treating the nanoparticles film at least one time to cause adhesion among the nanoparticles; and forming a light-absorbing layer by applying a light-absorbing solution on the nanoparticles film.

Abstract translation: 提供了制造光吸收层的示例性方法和制造包括该光吸收层的半导体器件的方法。 该示例性方法包括：通过在衬底上施加半导体纳米颗粒溶液形成纳米粒子膜; 至少一次热处理纳米粒子膜以引起纳米颗粒之间的粘附; 以及通过在纳米粒子膜上施加光吸收溶液而形成光吸收层。